Constant voltage stress induced degradation in HfO[sub 2]/SiO[sub 2] gate dielectric stacks
2004 ◽
Vol 44
(2)
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pp. 207-212
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Keyword(s):
2009 ◽
Vol 86
(3)
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pp. 287-290
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2013 ◽
Vol 53
(9-11)
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pp. 1798-1803
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2009 ◽
Vol 156
(8)
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pp. H661
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2012 ◽
Vol 52
(9-10)
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pp. 1895-1900
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