Observation of memory effect in germanium nanocrystals embedded in an amorphous silicon oxide matrix of a metal–insulator– semiconductor structure

W. K. Choi; W. K. Chim; C. L. Heng; L. W. Teo; Vincent Ho; V. Ng; D. A. Antoniadis; E. A. Fitzgerald

doi:10.1063/1.1459760

Observation of memory effect in germanium nanocrystals embedded in an amorphous silicon oxide matrix of a metal–insulator– semiconductor structure

Applied Physics Letters ◽

10.1063/1.1459760 ◽

2002 ◽

Vol 80 (11) ◽

pp. 2014-2016 ◽

Cited By ~ 127

Author(s):

W. K. Choi ◽

W. K. Chim ◽

C. L. Heng ◽

L. W. Teo ◽

Vincent Ho ◽

...

Keyword(s):

Amorphous Silicon ◽

Memory Effect ◽

Silicon Oxide ◽

Semiconductor Structure ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Germanium Nanocrystals ◽

Amorphous Silicon Oxide ◽

Oxide Matrix

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Nonvolatile Memory Effect in a Au/Cu–ZnO/p-Si Type of Metal–Insulator–Semiconductor Structure

IEEE Electron Device Letters ◽

10.1109/led.2011.2169231 ◽

2011 ◽

Vol 32 (12) ◽

pp. 1746-1748 ◽

Cited By ~ 7

Author(s):

T. Ghosh ◽

D. Basak

Keyword(s):

Memory Effect ◽

Nonvolatile Memory ◽

Semiconductor Structure ◽

Metal Insulator ◽

Metal Insulator Semiconductor

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Synthesizing germanium nanocrystals in amorphous silicon oxide by rapid thermal annealing

Philosophical Magazine B ◽

10.1080/014186300255366 ◽

2000 ◽

Vol 80 (4) ◽

pp. 729-739

Author(s):

W. K. Choi, H. H.Thio, S. P. Ng, B. A.

Keyword(s):

Amorphous Silicon ◽

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Silicon Oxide ◽

Germanium Nanocrystals ◽

Amorphous Silicon Oxide

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Frequency dependence of conductivity in intrinsic amorphous silicon carbide film, assessed through admittance measurement of metal insulator semiconductor structure

Thin Solid Films ◽

10.1016/j.tsf.2005.10.065 ◽

2006 ◽

Vol 497 (1-2) ◽

pp. 149-156 ◽

Cited By ~ 6

Author(s):

Orhan Ozdemir ◽

Ismail Atilgan ◽

Baris Akaoglu ◽

Kivanc Sel ◽

Bayram Katircioglu

Keyword(s):

Silicon Carbide ◽

Frequency Dependence ◽

Amorphous Silicon ◽

Semiconductor Structure ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Amorphous Silicon Carbide ◽

Silicon Carbide Film ◽

Admittance Measurement

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Size control and charge storage mechanism of germanium nanocrystals in a metal-insulator-semiconductor structure

Applied Physics Letters ◽

10.1063/1.1519355 ◽

2002 ◽

Vol 81 (19) ◽

pp. 3639-3641 ◽

Cited By ~ 52

Author(s):

L. W. Teo ◽

W. K. Choi ◽

W. K. Chim ◽

V. Ho ◽

C. M. Moey ◽

...

Keyword(s):

Size Control ◽

Semiconductor Structure ◽

Charge Storage ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Storage Mechanism ◽

Germanium Nanocrystals ◽

Charge Storage Mechanism

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Capacitance-voltage characteristics of amorphous silicon based metal-insulator-semiconductor structure

Proceedings Ninth Biennial University/Government/Industry Microelectronics Symposium ◽

10.1109/ugim.1991.148130 ◽

2002 ◽

Author(s):

J.S. Choi ◽

G.W. Neudeck

Keyword(s):

Amorphous Silicon ◽

Semiconductor Structure ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Capacitance Voltage ◽

Silicon Based

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ZnO Light Emitting Diodes Using ZnO Quantum Dots Embedded in an Amorphous Silicon-Oxide Matrix

Journal of the Korean Physical Society ◽

10.3938/jkps.58.1664 ◽

2011 ◽

Vol 58 (6) ◽

pp. 1664-1667 ◽

Cited By ~ 4

Author(s):

Jae-Hong Lim ◽

Kyu Hwan Lee ◽

Dong Chan Lim

Keyword(s):

Quantum Dots ◽

Amorphous Silicon ◽

Light Emitting Diodes ◽

Silicon Oxide ◽

Light Emitting ◽

Amorphous Silicon Oxide ◽

Oxide Matrix ◽

Zno Quantum Dots

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The formation of Ge nanocrystals in a metal–insulator–semiconductor structure and its memory effect

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2003.10.068 ◽

2004 ◽

Vol 262 (1-4) ◽

pp. 95-104 ◽

Cited By ~ 17

Author(s):

C.L. Heng ◽

Y.J. Liu ◽

A.T.S. Wee ◽

T.G. Finstad

Keyword(s):

Memory Effect ◽

Semiconductor Structure ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Ge Nanocrystals

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Synthesizing germanium nanocrystals in amorphous silicon oxide by rapid thermal annealing

Philosophical Magazine B ◽

10.1080/13642810008209779 ◽

2000 ◽

Vol 80 (4) ◽

pp. 729-739 ◽

Cited By ~ 6

Author(s):

W. K. Choi ◽

H. H. Thio ◽

S. P. Ng ◽

V. Ng ◽

B. A. Cheong

Keyword(s):

Amorphous Silicon ◽

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Silicon Oxide ◽

Germanium Nanocrystals ◽

Amorphous Silicon Oxide

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Raman characterization of germanium nanocrystals in amorphous silicon oxide films synthesized by rapid thermal annealing

Journal of Applied Physics ◽

10.1063/1.370901 ◽

1999 ◽

Vol 86 (3) ◽

pp. 1398-1403 ◽

Cited By ~ 86

Author(s):

W. K. Choi ◽

V. Ng ◽

S. P. Ng ◽

H. H. Thio ◽

Z. X. Shen ◽

...

Keyword(s):

Amorphous Silicon ◽

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Silicon Oxide ◽

Oxide Films ◽

Germanium Nanocrystals ◽

Amorphous Silicon Oxide ◽

Raman Characterization

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Shrinking of silicon nanocrystals embedded in an amorphous silicon oxide matrix during rapid thermal annealing in a forming gas atmosphere

Nanotechnology ◽

10.1088/0957-4484/27/36/365601 ◽

2016 ◽

Vol 27 (36) ◽

pp. 365601 ◽

Cited By ~ 5

Author(s):

M van Sebille ◽

A Fusi ◽

L Xie ◽

H Ali ◽

R A C M M van Swaaij ◽

...

Keyword(s):

Amorphous Silicon ◽

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Silicon Nanocrystals ◽

Silicon Oxide ◽

Gas Atmosphere ◽

Amorphous Silicon Oxide ◽

Oxide Matrix

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