Raman characterization of germanium nanocrystals in amorphous silicon oxide films synthesized by rapid thermal annealing

1999 ◽  
Vol 86 (3) ◽  
pp. 1398-1403 ◽  
Author(s):  
W. K. Choi ◽  
V. Ng ◽  
S. P. Ng ◽  
H. H. Thio ◽  
Z. X. Shen ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Germanium Nanocrystals ◽  
Amorphous Silicon Oxide ◽  
Raman Characterization

Electrical characterization of hydrogenated amorphous silicon oxide films

2015 ◽  
Vol 54 (8S1) ◽  
pp. 08KB11 ◽  
Author(s):  
Takashi Itoh ◽  
Ryuichi Katayama ◽  
Koki Yamakawa ◽  
Kento Matsui ◽  
Masaru Saito ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Hydrogenated Amorphous Silicon ◽  
Electrical Characterization ◽  
Amorphous Silicon Oxide ◽  
Hydrogenated Amorphous

Micro-Raman characterization of Ge diffusion and Si stress change in thin epitaxial Si1−xGex layers on Si(100) after rapid thermal annealing

2012 ◽  
Vol 27 (9) ◽  
pp. 1314-1323 ◽  
Author(s):  
Chun-Wei Chang ◽  
Min-Hao Hong ◽  
Wei-Fan Lee ◽  
Kuan-Ching Lee ◽  
Li-De Tseng ◽  
...  
Keyword(s):  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Stress Change ◽  
Image Position ◽  
Raman Characterization

Abstract

Micro-Raman Characterization of Cluster Carbon Implanted Si before and after Rapid Thermal Annealing

2016 ◽  
Vol 75 (8) ◽  
pp. 605-613
Author(s):  
W. S. Yoo ◽  
K. Kang ◽  
H. Nishigaki ◽  
N. Hasuike ◽  
H. Harima ◽  
...  
Keyword(s):  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Before And After ◽  
Raman Characterization
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