Subsurface reactions of silicon nitride in a highly selective etching process of silicon oxide over silicon nitride

2002 ◽  
Vol 91 (5) ◽  
pp. 3452-3458 ◽  
Author(s):  
Masafumi Ito ◽  
Kiyoshi Kamiya ◽  
Masaru Hori ◽  
Toshio Goto
Keyword(s):  
Silicon Nitride ◽  
Silicon Oxide ◽  
Selective Etching ◽  
Etching Process

scholarly journals A comparison study of boron emitter passivation by silicon oxide and a PECVD silicon nitride stack

2017 ◽  
Vol 124 ◽  
pp. 288-294 ◽  
Author(s):  
Barbora Mojrová ◽  
Haifeng Chu ◽  
Christop Peter ◽  
Pirmin Preis ◽  
Jan Lossen ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Silicon Oxide ◽  
Comparison Study

Changes in the optical properties of films of silicon nitride, silicon oxinitride, and silicon oxide upon ion irradiation

1977 ◽  
Vol 26 (1) ◽  
pp. 129-131
Author(s):  
N. N. Gerasimenko ◽  
T. I. Kovalevskaya ◽  
V. G. Pan'kin ◽  
K. K. Svitashev ◽  
G. M. Tseitlin
Keyword(s):  
Optical Properties ◽  
Silicon Nitride ◽  
Silicon Oxide ◽  
Ion Irradiation

scholarly journals Selective etching of 10 MHz repetition rate fs-laser inscribed tracks in YAG

2021 ◽  
Vol 255 ◽  
pp. 10003
Author(s):  
Kore Hasse ◽  
Detlef Kip ◽  
Christian Kränkel
Keyword(s):  
Aspect Ratio ◽  
Repetition Rate ◽  
Laser System ◽  
Selective Etching ◽  
Etching Process ◽  
Acid Mixture ◽  
Laser Structuring ◽  
Order Of Magnitude ◽  
Fs Laser

We investigated fs-laser structuring of YAG crystals at high writing velocities up to 100 mm/s using a commercial 10 MHz fs-laser system supplied by Coherent Inc. and selective etching of these structures for fabrication of ultrahigh aspect ratio microchannels. Usage of a diluted acid mixture of 22% H3PO4 and 24% H2SO4 accelerated the etching process significantly to an etching parameter D of 11.2 μm2/s, which is three times higher than previously reported. Additionally, the selectivity of the etching process was increased by an order of magnitude.

Synthesis of coaxial nanowires of silicon nitride sheathed with silicon and silicon oxide

2000 ◽  
Vol 115 (12) ◽  
pp. 683-686 ◽  
Author(s):  
X.C Wu ◽  
W.H Song ◽  
B Zhao ◽  
W.D Huang ◽  
M.H Pu ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Silicon Oxide
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