Vapor–liquid–solid tri-phase pulsed-laser epitaxy of RBa2Cu3O7−y single-crystal films

2002 ◽  
Vol 80 (1) ◽  
pp. 61-63 ◽  
Author(s):  
K. S. Yun ◽  
B. D. Choi ◽  
Y. Matsumoto ◽  
J. H. Song ◽  
N. Kanda ◽  
...  
Keyword(s):  
Single Crystal ◽  
Pulsed Laser ◽  
Vapor Liquid Solid ◽  
Single Crystal Films ◽  
Crystal Films ◽  
Vapor Liquid

Vapor-liquid-solid growth of 4H-SiC single crystal films with extremely low carrier densities in chemical vapor deposition with Pt-Si alloy flux and X-ray topography analysis of its dislocation propagation behaviors

CrystEngComm ◽  
2021 ◽  
Author(s):  
Naoki Sannodo ◽  
Tomohisa Kato ◽  
Yoshiyuki Yonezawa ◽  
Kazutoshi Kojima ◽  
Y. Matsumoto
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Vapor Liquid Solid ◽  
Homoepitaxial Growth ◽  
Single Crystal Films ◽  
Crystal Films ◽  
Pt Alloy ◽  
Sic Films ◽  
Vapor Liquid

A vapor-liquid-solid (VLS) mechanism has been successfully applied to homoepitaxial growth of 4H-SiC films in chemical vapor deposition (CVD), the key to which is the use of a Si-Pt alloy...

Uniform growth of SiC single crystal thin films via a metal–Si alloy flux by vapour–liquid–solid pulsed laser deposition: the possible existence of a precursor liquid flux film

CrystEngComm ◽  
2016 ◽  
Vol 18 (1) ◽  
pp. 143-148 ◽  
Author(s):  
Aomi Onuma ◽  
Shingo Maruyama ◽  
Takeshi Mitani ◽  
Tomohisa Kato ◽  
Hajime Okumura ◽  
...  
Keyword(s):  
Thin Films ◽  
High Temperature ◽  
Single Crystal ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Liquid Flux ◽  
Single Crystal Films ◽  
Crystal Films ◽  
Interfacial Behaviour

3C-SiC single crystal films were successfully obtained in the PLD-based VLS process with a Si–Ni liquid flux, the interfacial behaviour of which was investigated by in situ high temperature laser microscopy in vacuum.

Structure of Palladium Single-Crystal Films Prepared by Flash Evaporation onto (001) NaCl Substrates

1970 ◽  
Vol 28 ◽  
pp. 456-457
Author(s):  
L. E. Murr ◽  
G. Wong
Keyword(s):  
Single Crystal ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
High Rate ◽  
Flash Evaporation ◽  
Optimum Load ◽  
Single Crystal Films ◽  
Crystal Films ◽  
A Current

Palladium single-crystal films have been prepared by Matthews in ultra-high vacuum by evaporation onto (001) NaCl substrates cleaved in-situ, and maintained at ∼ 350° C. Murr has also produced large-grained and single-crystal Pd films by high-rate evaporation onto (001) NaCl air-cleaved substrates at 350°C. In the present work, very large (∼ 3cm2), continuous single-crystal films of Pd have been prepared by flash evaporation onto air-cleaved (001) NaCl substrates at temperatures at or below 250°C. Evaporation rates estimated to be ≧ 2000 Å/sec, were obtained by effectively short-circuiting 1 mil tungsten evaporation boats in a self-regulating system which maintained an optimum load current of approximately 90 amperes; corresponding to a current density through the boat of ∼ 4 × 104 amperes/cm2.

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