scholarly journals Formation of Stacking Faults in Single‐Crystal Films of Copper Grown on NaCl, KCl, and LiF Substrates

1966 ◽  
Vol 37 (7) ◽  
pp. 2703-2709 ◽  
Author(s):  
A. P. Rowe ◽  
L. O. Brockway
Author(s):  
Anne P. Rowe ◽  
L. O. Brockway

As an extension of previous work in this laboratory on the reaction of oxygen with thin single crystal films of copper, the reaction has been studied at an oxygen pressure of 3 x 10-6 torr at 525°C. The films were grown by evaporation onto (100) NaCl substrates and subsequently annealed to produce (100) copper films about 800 Å thick with wide complex stacking faults and 50 to 150 Å high surface terraces.


Author(s):  
L. E. Murr ◽  
G. Wong

Palladium single-crystal films have been prepared by Matthews in ultra-high vacuum by evaporation onto (001) NaCl substrates cleaved in-situ, and maintained at ∼ 350° C. Murr has also produced large-grained and single-crystal Pd films by high-rate evaporation onto (001) NaCl air-cleaved substrates at 350°C. In the present work, very large (∼ 3cm2), continuous single-crystal films of Pd have been prepared by flash evaporation onto air-cleaved (001) NaCl substrates at temperatures at or below 250°C. Evaporation rates estimated to be ≧ 2000 Å/sec, were obtained by effectively short-circuiting 1 mil tungsten evaporation boats in a self-regulating system which maintained an optimum load current of approximately 90 amperes; corresponding to a current density through the boat of ∼ 4 × 104 amperes/cm2.


2001 ◽  
Vol 27 (6) ◽  
pp. 451-453 ◽  
Author(s):  
S. S. Kucherenko ◽  
V. P. Pashchenko ◽  
P. I. Polyakov ◽  
S. I. Khartsev ◽  
V. A. Shtaba

1993 ◽  
Vol 73 (11) ◽  
pp. 7969-7971 ◽  
Author(s):  
Qixin Guo ◽  
Osamu Kato ◽  
Akira Yoshida

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