Chemical role of oxygen plasma in wafer bonding using borosilicate glasses

2001 ◽  
Vol 79 (21) ◽  
pp. 3413-3415 ◽  
Author(s):  
D. M. Hansen ◽  
C. E. Albaugh ◽  
P. D. Moran ◽  
T. F. Kuech
2010 ◽  
Vol 13 (6) ◽  
pp. H179 ◽  
Author(s):  
B. Raeissi ◽  
A. Sanz-Velasco ◽  
O. Engström

2017 ◽  
Vol 07 (02) ◽  
pp. 22-33 ◽  
Author(s):  
Gomaa El-Damrawi ◽  
Abdelmeguid K. Hassan ◽  
Salma Ehmead ◽  
Amal El Shahawy

Author(s):  
M.K. Weldon ◽  
Y.J. Chabal ◽  
S.B. Christman ◽  
J. Bourcereau ◽  
C.A. Goodwin ◽  
...  

2011 ◽  
Vol 357 (7) ◽  
pp. 1647-1656 ◽  
Author(s):  
A.J. Connelly ◽  
N.C. Hyatt ◽  
K.P. Travis ◽  
R.J. Hand ◽  
E.R. Maddrell ◽  
...  

2020 ◽  
Vol 542 ◽  
pp. 120136
Author(s):  
Ashwitha Nancy D'Souza ◽  
Nimitha S. Prabhu ◽  
K. Sharmila ◽  
M. I Sayyed ◽  
H. M Somshekarappa ◽  
...  

2000 ◽  
Vol 147 (7) ◽  
pp. 2699 ◽  
Author(s):  
Donato Pasquariello ◽  
Christer Hedlund ◽  
Klas Hjort
Keyword(s):  

ChemInform ◽  
2010 ◽  
Vol 29 (31) ◽  
pp. no-no
Author(s):  
C. GUI ◽  
M. ELWENSPOEK ◽  
J. G. E. GARDENIERS ◽  
P. V. LAMBECK

1979 ◽  
Vol 40 (C7) ◽  
pp. C7-135-C7-136
Author(s):  
J. W. Dettmer ◽  
A. Garscadden
Keyword(s):  

2010 ◽  
Vol 2010 (1) ◽  
pp. 000355-000360
Author(s):  
James Hermanowski ◽  
Greg George

There are numerous process integration schemes currently in place for the implementation of 3D-IC. Via first, via middle, via last along with back end of line (BEOL), front end of line (FEOL) and other variations of these approaches. This work will explore the role of wafer bonding, both permanent and temporary, in the fabrication of 3D-IC. Additionally, the materials and process flows used for these processes will be examined in detail.


Sign in / Sign up

Export Citation Format

Share Document