Monte Carlo based analysis of intermodulation distortion behavior in GaN–AlxGa1−xN high electron mobility transistors for microwave applications

2001 ◽  
Vol 90 (6) ◽  
pp. 3030-3037
Author(s):  
T. Li ◽  
R. P. Joshi ◽  
R. D. del Rosario ◽  
C. Fazi
VLSI Design ◽  
2001 ◽  
Vol 13 (1-4) ◽  
pp. 435-439 ◽  
Author(s):  
K. Kalna ◽  
A. Asenov ◽  
K. Elgaid ◽  
I. Thayne

The effect of scaling into deep decanano dimensions on the performance of pseudomorphic high electron mobility transistors (pHEMTs) is extensively studied using Monte Carlo simulations. The scaling of devices with gate lengths of 120, 70, 50 and 30nm is performed in both lateral and vertical directions. The devices exhibit a significant improvement in transconductance during scaling, even though external resistances become a limiting factor.


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