Role of adsorption kinetics in the low-temperature Si growth by gas-source molecular beam epitaxy:In situobservations and detailed modeling of the growth
Keyword(s):
1997 ◽
Vol 36
(Part 2, No. 6A)
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pp. L703-L704
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Keyword(s):
1989 ◽
Vol 97
(3-4)
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pp. 587-590
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Keyword(s):
Keyword(s):
2002 ◽
Vol 20
(3)
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pp. 1221
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