Comparison of the radio frequency hollow cathode to the microwave antenna discharge for plasma processing

2001 ◽  
Vol 90 (4) ◽  
pp. 1703-1709 ◽  
Author(s):  
L. Bárdoš ◽  
H. Baránková ◽  
Th. Welzel ◽  
I. Dani ◽  
S. Peter ◽  
...  
Keyword(s):  
Radio Frequency ◽  
Hollow Cathode ◽  
Plasma Processing ◽  
Microwave Antenna

Plasma processing of AISI 304 stainless steel using radio frequency hollow cathode discharge

2007 ◽  
Vol 201 (19-20) ◽  
pp. 8650-8653 ◽  
Author(s):  
X.B. Tian ◽  
H.F. Jiang ◽  
S.Q. Yang ◽  
Z.J. Luo ◽  
R.K.Y. Fu ◽  
...  
Keyword(s):  
Stainless Steel ◽  
Radio Frequency ◽  
Hollow Cathode ◽  
Plasma Processing ◽  
Hollow Cathode Discharge ◽  
304 Stainless Steel ◽  
Aisi 304 Stainless Steel ◽  
Aisi 304

scholarly journals Uses of radio emission spectroscopy for non-contact and in situ diagnostics of low pressure radio frequency plasma processing

2021 ◽  
Author(s):  
Rajani K. Vijayaraghavan ◽  
Sean Kelly ◽  
David Coates ◽  
Cezar Gaman ◽  
Niall MacGearailt ◽  
...  
Keyword(s):  
Radio Emission ◽  
Radio Frequency ◽  
Emission Spectroscopy ◽  
Near Field ◽  
Plasma Processing ◽  
Diagnostic Technique ◽  
Primary Source ◽  
Low Pressure ◽  
Chamber Pressure ◽  
Rf Plasma

Abstract We demonstrate that a passive non-contact diagnostic technique, radio emission spectroscopy (RES), provides a sensitive monitor of currents in a low pressure radio frequency (RF) plasma. A near field magnetic loop antenna was used to capture RF emissions from the plasma without perturbing it. The analysis was implemented for a capacitively coupled RF plasma with an RF supply at a frequency of 13.56 MHz. Real-time measurements are captured in scenarios relevant to contemporary challenges faced during semiconductor fabrication (e.g. window coating and wall disturbance). Exploration of the technique for key equipment parameters including applied RF power, chamber pressure, RF bias frequencies and chamber wall cleanliness shows sensitive and repeatable function. In particular, the induced RES signal was found to vary sensitively to pressure changes and we were able to detect pressure and power variations as low as ~2.5 %/mtorr and ~3.5 %/watt, respectively, during the plasma processing during a trial generic plasma process. Finally, we explored the ability of RES to monitor the operation of a multiple frequency low-pressure RF plasma system (f1 = 2 MHz, f2 = 162 MHz) and intermixing products which suggests strongly that the plasma sheaths are the primary source of this non-linear diode mixing effect.

Hydrogen/oxygen radio-frequency plasma processing of LiNbO3

1996 ◽  
Author(s):  
Hana Turcicova ◽  
Jiri Vacik ◽  
Jarmila Cervena ◽  
Vladimir Zelezny
Keyword(s):  
Radio Frequency ◽  
Plasma Processing ◽  
Radio Frequency Plasma ◽  
Frequency Plasma

Burst Radio-Frequency Excited Pulsed Hollow-Cathode Lamp

1980 ◽  
Vol 34 (1) ◽  
pp. 33-39 ◽  
Author(s):  
Tsutomu Araki ◽  
John P. Walters ◽  
Shigeo Minami
Keyword(s):  
Radio Frequency ◽  
Hollow Cathode ◽  
Line Intensity ◽  
Emission Characteristics ◽  
Pulsed Current ◽  
Radio Frequency Field ◽  
Hollow Cathode Lamp ◽  
Practical Analysis ◽  
Frequency Burst ◽  
Radio Frequency Voltage

Transient emission characteristics of a hollow-cathode lamp driven by a pulsed current in combination with a radio-frequency burst signal are described. The radio-frequency field excites electrode vapor that is transiently produced by the initial pulsed current discharge. To evaluate the performance of this radio-frequency injected lamp; peak line intensity, line width and line stability of Cu atomic and ionic emissions are compared to those from dc and pulsed current lamps. Results indicate that the radio-frequency lamp is superior to the conventional pulsed lamp in these three factors. However, due to experimental limitations of commercial lamps under applied radio-frequency voltage, the maximum possible intensity enhancement was not achieved. Atomic absorption working curves are also compared to anticipate practical situations. The steep and linear curve obtained using the radio-frequency lamp suggests its important role in practical analysis.

scholarly journals Theoretical Study of Plasma Using Different Dimension of Hollow Cathode

2019 ◽  
Vol 5 (1) ◽  
pp. 30-34
Author(s):  
L. N. Mishra ◽  
K. Khanal
Keyword(s):  
Glow Discharge ◽  
Hollow Cathode ◽  
Theoretical Study ◽  
Plasma Processing ◽  
Theoretical Work ◽  
Plasma Potential ◽  
Gas Pressure ◽  
Floating Potential ◽  
Discharge Behavior

This article deals about the theoretical study on DC hollow cathode glow discharge using different hollow cathode geometry. The mechanism of discharge is analyzed at various gas pressure and radial configuration. The dependence of temperature on gas pressure has been elucidated with the help of Scotty limit. Discharge behavior with radius has also been explained. It is revealed that floating potential increases as gas pressure increases whereas plasma potential decreases as gas pressure increases. This theoretical work resembles with the experimentally measured results. This work might be useful for the plasma processing for industrial purposes.

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