Direct three-dimensional patterning using nanoimprint lithography

Mingtao Li; Lei Chen; Stephen Y. Chou

doi:10.1063/1.1375006

Mastering of NIL Stamps with Undercut T-Shaped Features from Single Layer to Multilayer Stamps

Nanomaterials ◽

10.3390/nano11040956 ◽

2021 ◽

Vol 11 (4) ◽

pp. 956

Author(s):

Philipp Taus ◽

Adrian Prinz ◽

Heinz D. Wanzenboeck ◽

Patrick Schuller ◽

Anton Tsenov ◽

...

Keyword(s):

Electron Beam Lithography ◽

Nanoimprint Lithography ◽

Silicon Oxide ◽

Three Dimensional ◽

Single Layer ◽

Fabrication Technology ◽

Large Area ◽

Structural Colors ◽

Biomimetic Structures ◽

Morpho Butterfly

Biomimetic structures such as structural colors demand a fabrication technology of complex three-dimensional nanostructures on large areas. Nanoimprint lithography (NIL) is capable of large area replication of three-dimensional structures, but the master stamp fabrication is often a bottleneck. We have demonstrated different approaches allowing for the generation of sophisticated undercut T-shaped masters for NIL replication. With a layer-stack of phase transition material (PTM) on poly-Si, we have demonstrated the successful fabrication of a single layer undercut T-shaped structure. With a multilayer-stack of silicon oxide on silicon, we have shown the successful fabrication of a multilayer undercut T-shaped structures. For patterning optical lithography, electron beam lithography and nanoimprint lithography have been compared and have yielded structures from 10 µm down to 300 nm. The multilayer undercut T-shaped structures closely resemble the geometry of the surface of a Morpho butterfly, and may be used in future to replicate structural colors on artificial surfaces.

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High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography

Nanophotonics ◽

10.1515/nanoph-2021-0263 ◽

2021 ◽

Vol 0 (0) ◽

Author(s):

Elmina Kabouraki ◽

Vasileia Melissinaki ◽

Amit Yadav ◽

Andrius Melninkaitis ◽

Konstantina Tourlouki ◽

...

Keyword(s):

Nanoimprint Lithography ◽

Three Dimensional ◽

Damage Threshold ◽

Laser Pulses ◽

Intense Laser ◽

Optical Elements ◽

Photonic Circuits ◽

Future Production ◽

Intense Laser Pulses ◽

Laser Induced Damage

Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.

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Three-Dimensional Compatible Sacrificial Nanoimprint Lithography for Tuning the Wettability of Thermoplastic Materials

Journal of Micro and Nano-Manufacturing ◽

10.1115/1.4041532 ◽

2018 ◽

Vol 6 (4) ◽

Cited By ~ 1

Author(s):

Molla Hasan ◽

Imrhankhan Shajahan ◽

Manesh Gopinadhan ◽

Jittisa Ketkaew ◽

Aaron Anesgart ◽

...

Keyword(s):

Nanoimprint Lithography ◽

Characteristic Length ◽

Three Dimensional ◽

Thermoplastic Elastomer ◽

Growth Conditions ◽

Surface Wetting ◽

Chemical Surface ◽

Patterned Surface ◽

Elastomeric Material ◽

Hydrophilicity And Hydrophobicity

We report the tuning of surface wetting through sacrificial nanoimprint lithography (SNIL). In this process, grown ZnO nanomaterials are transferred by imprint into a metallic glass (MG) and an elastomeric material, and then etched to impart controlled surface roughness. This process increases the hydrophilicity and hydrophobicity of both surfaces, the Pt57.5Cu14.7Ni5.3P22.5 MG and thermoplastic elastomer (TPE), respectively. The growth conditions of the ZnO change the characteristic length scale of the roughness, which in turn alters the properties of the patterned surface. The novelty of this approach includes reusability of templates and that it is able to create superhydrophilic and superhydrophobic surfaces in a manner compatible with the fabrication of macroscopic three-dimensional (3D) parts. Because the wettability is achieved by only modifying topography, without using any chemical surface modifiers, the prepared surfaces are relatively more durable.

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Integrated 3D Hydrogel Waveguide Out-Coupler by Step-and-Repeat Thermal Nanoimprint Lithography: A Promising Sensor Device for Water and pH

Sensors ◽

10.3390/s18103240 ◽

2018 ◽

Vol 18 (10) ◽

pp. 3240 ◽

Cited By ~ 5

Author(s):

Achille Francone ◽

Timothy Kehoe ◽

Isabel Obieta ◽

Virginia Saez-Martinez ◽

Leire Bilbao ◽

...

Keyword(s):

Optical Sensors ◽

Nanoimprint Lithography ◽

Three Dimensional ◽

Single Step ◽

Poly Ethylene Glycol ◽

Sensor Device ◽

Stimulus Responsive ◽

Poly Ethylene ◽

Small Change ◽

Set Up

Hydrogel materials offer many advantages for chemical and biological sensoring due to their response to a small change in their environment with a related change in volume. Several designs have been outlined in the literature in the specific field of hydrogel-based optical sensors, reporting a large number of steps for their fabrication. In this work we present a three-dimensional, hydrogel-based sensor the structure of which is fabricated in a single step using thermal nanoimprint lithography. The sensor is based on a waveguide with a grating readout section. A specific hydrogel formulation, based on a combination of PEGDMA (Poly(Ethylene Glycol DiMethAcrylate)), NIPAAm (N-IsoPropylAcrylAmide), and AA (Acrylic Acid), was developed. This stimulus-responsive hydrogel is sensitive to pH and to water. Moreover, the hydrogel has been modified to be suitable for fabrication by thermal nanoimprint lithography. Once stimulated, the hydrogel-based sensor changes its topography, which is characterised physically by AFM and SEM, and optically using a specific optical set-up.

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