Novel ion-molecular surface reaction to result in CH3 adsorbates on (111) surface of chemical vapor deposition diamond from ethane and surface anionic sites

Shojiro Komatsu; Katsuyuki Okada; Yoshiki Shimizu; Yusuke Moriyoshi

doi:10.1063/1.1369393

Novel ion-molecular surface reaction to result in CH3 adsorbates on (111) surface of chemical vapor deposition diamond from ethane and surface anionic sites

Journal of Applied Physics ◽

10.1063/1.1369393 ◽

2001 ◽

Vol 89 (12) ◽

pp. 8291-8296 ◽

Cited By ~ 2

Author(s):

Shojiro Komatsu ◽

Katsuyuki Okada ◽

Yoshiki Shimizu ◽

Yusuke Moriyoshi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Surface Reaction ◽

Chemical Vapor ◽

Molecular Surface ◽

Chemical Vapor Deposition Diamond ◽

Anionic Sites

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Simulations of chemical vapor deposition diamond film growth using a kinetic Monte Carlo model

Journal of Applied Physics ◽

10.1063/1.3437647 ◽

2010 ◽

Vol 108 (1) ◽

pp. 014905 ◽

Cited By ~ 31

Author(s):

P. W. May ◽

J. N. Harvey ◽

N. L. Allan ◽

J. C. Richley ◽

Yu. A. Mankelevich

Keyword(s):

Monte Carlo ◽

Chemical Vapor Deposition ◽

Diamond Film ◽

Vapor Deposition ◽

Film Growth ◽

Kinetic Monte Carlo ◽

Monte Carlo Model ◽

Chemical Vapor ◽

Chemical Vapor Deposition Diamond ◽

Diamond Film Growth

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Ion beam induced surface modification of chemical vapor deposition diamond for x-ray beam position monitor applications

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580593 ◽

1997 ◽

Vol 15 (3) ◽

pp. 1200-1205 ◽

Cited By ~ 1

Author(s):

Chian Liu ◽

D. Shu ◽

T. M. Kuzay ◽

L. Wen ◽

C. A. Melendres

Keyword(s):

Surface Modification ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Ion Beam ◽

Chemical Vapor ◽

Chemical Vapor Deposition Diamond ◽

Beam Position Monitor ◽

Beam Position ◽

X Ray

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Publisher’s Note: “Electron and hole drift velocity in chemical vapor deposition diamond” [J. Appl. Phys. 109, 063719 (2011)]

Journal of Applied Physics ◽

10.1063/1.3592663 ◽

2011 ◽

Vol 109 (10) ◽

pp. 109906 ◽

Cited By ~ 2

Author(s):

Markus Gabrysch ◽

Saman Majdi ◽

Daniel J. Twitchen ◽

Jan Isberg

Keyword(s):

Chemical Vapor Deposition ◽

Drift Velocity ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Diamond

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Characterization of single crystal chemical vapor deposition diamond detectors for neutron spectrometry

Review of Scientific Instruments ◽

10.1063/1.4733300 ◽

2012 ◽

Vol 83 (10) ◽

pp. 10D906 ◽

Cited By ~ 3

Author(s):

F. Gagnon-Moisan ◽

A. Zimbal ◽

R. Nolte ◽

M. Reginatto ◽

H. Schuhmacher

Keyword(s):

Chemical Vapor Deposition ◽

Single Crystal ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Diamond ◽

Crystal Chemical ◽

Neutron Spectrometry

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Electron and hole drift velocity in chemical vapor deposition diamond

Journal of Applied Physics ◽

10.1063/1.3554721 ◽

2011 ◽

Vol 109 (6) ◽

pp. 063719 ◽

Cited By ~ 29

Author(s):

Markus Gabrysch ◽

Saman Majdi ◽

Daniel J. Twitchen ◽

Jan Isberg

Keyword(s):

Chemical Vapor Deposition ◽

Drift Velocity ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Diamond

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Erratum to: “Field-emission characteristics of chemical vapor deposition-diamond films”

Thin Solid Films ◽

10.1016/s0040-6090(00)01076-2 ◽

2000 ◽

Vol 372 (1-2) ◽

pp. 292-299 ◽

Cited By ~ 4

Author(s):

X.L. Peng

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Emission Characteristics ◽

Chemical Vapor Deposition Diamond

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Elastic constants of chemical-vapor-deposition diamond thin films: resonance ultrasound spectroscopy with laser-Doppler interferometry

Acta Materialia ◽

10.1016/j.actamat.2003.10.012 ◽

2004 ◽

Vol 52 (3) ◽

pp. 765-771 ◽

Cited By ~ 57

Author(s):

Nobutomo Nakamura ◽

Hirotsugu Ogi ◽

Masahiko Hirao

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Elastic Constants ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Doppler ◽

Chemical Vapor Deposition Diamond ◽

Diamond Thin Films

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Reactive force-field molecular dynamics simulation for the surface reaction of SiH (x = 2–4) species on Si(1 0 0)-(2 × 1):H surfaces in chemical vapor deposition processes

Computational Materials Science ◽

10.1016/j.commatsci.2022.111193 ◽

2022 ◽

Vol 204 ◽

pp. 111193

Author(s):

Naoya Uene ◽

Takuya Mabuchi ◽

Masaru Zaitsu ◽

Shigeo Yasuhara ◽

Takashi Tokumasu

Keyword(s):

Molecular Dynamics ◽

Chemical Vapor Deposition ◽

Molecular Dynamics Simulation ◽

Force Field ◽

Vapor Deposition ◽

Surface Reaction ◽

Chemical Vapor ◽

Dynamics Simulation ◽

Reactive Force ◽

Deposition Processes

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Laser flatting chemical vapor deposition diamond films by axial offset-focus

High Power Laser and Particle Beams ◽

10.3788/hplpb20132508.1916 ◽

2013 ◽

Vol 25 (8) ◽

pp. 1916-1920

Author(s):

严垒 Yan Lei ◽

马志斌 Ma Zhibin ◽

张璋 Zhang Zhang ◽

邓煜恒 Deng Yuheng ◽

王兴立 Wang Xingli

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Chemical Vapor Deposition Diamond

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Study of chemical vapor deposition diamond film evolution from a nanodiamond precursor by C13 isotopic labeling and ion implantation

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1319677 ◽

2000 ◽

Vol 18 (6) ◽

pp. 2997-3003 ◽

Cited By ~ 3

Author(s):

I. Gouzman ◽

V. Richter ◽

S. Rotter ◽

A. Hoffman

Keyword(s):

Chemical Vapor Deposition ◽

Ion Implantation ◽

Diamond Film ◽

Vapor Deposition ◽

Chemical Vapor ◽

Isotopic Labeling ◽

Chemical Vapor Deposition Diamond

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