Study of chemical vapor deposition diamond film evolution from a nanodiamond precursor by C13 isotopic labeling and ion implantation

2000 ◽  
Vol 18 (6) ◽  
pp. 2997-3003 ◽  
Author(s):  
I. Gouzman ◽  
V. Richter ◽  
S. Rotter ◽  
A. Hoffman
Keyword(s):  
Chemical Vapor Deposition ◽  
Ion Implantation ◽  
Diamond Film ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Isotopic Labeling ◽  
Chemical Vapor Deposition Diamond

Synchrotron radiation x-ray beam profile monitor using chemical vapor deposition diamond film

2006 ◽  
Vol 77 (12) ◽  
pp. 123105 ◽  
Author(s):  
Togo Kudo ◽  
Sunao Takahashi ◽  
Nobuteru Nariyama ◽  
Toko Hirono ◽  
Takeshi Tachibana ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Synchrotron Radiation ◽  
Diamond Film ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Beam Profile ◽  
Chemical Vapor Deposition Diamond ◽  
X Ray ◽  
Beam Profile Monitor

Ultraviolet Raman spectroscopy characterizes chemical vapor deposition diamond film growth and oxidation

1995 ◽  
Vol 77 (11) ◽  
pp. 5916-5923 ◽  
Author(s):  
Richard W. Bormett ◽  
Sanford A. Asher ◽  
Robert E. Witowski ◽  
William D. Partlow ◽  
Robert Lizewski ◽  
...  
Keyword(s):  
Raman Spectroscopy ◽  
Chemical Vapor Deposition ◽  
Diamond Film ◽  
Vapor Deposition ◽  
Film Growth ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Diamond ◽  
Diamond Film Growth

Uniform Deposition of Chemical Vapor Deposition Diamond Films on Slender Tungsten Wires

2016 ◽  
Vol 848 ◽  
pp. 618-623
Author(s):  
Xin Chang Wang ◽  
Xiao Tian Shen ◽  
Tian Qi Zhao ◽  
Fang Hong Sun ◽  
Bin Shen
Keyword(s):  
Chemical Vapor Deposition ◽  
Diamond Film ◽  
Vapor Deposition ◽  
High Surface ◽  
Diamond Films ◽  
Surface Hardness ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Diamond ◽  
Substrate Adhesion ◽  
Film Substrate

In the present study, high-quality chemical vapor deposition (CVD) micro-crystalline diamond (MCD) film was successfully deposited on the surface of the Φ0.5 mm×120 mm tungsten wire using a special designed graphitic jig for supporting the substrate and a two-step deposition procedure for guaranteeing the uniformity of as-deposited diamond film. It is proved that as-deposited film indeed presented much more uniform thickness than that obtained using a conventional jig described in the previous literature, and a very thick WC interlayer spontaneously formed between the substrate and the diamond film, which together with as-deposited MCD film have significant effects on mechanical properties of the wire. Generally speaking, the coated wire remains extremely high surface hardness of the MCD film and considerable toughness of the substrate, along with favorable film-substrate adhesion. It is recognized that these the coated tungsten wires have broad application prospects, but the technologies for depositing diamond films that are thick enough on even longer and thinner wires still need further investigation.

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