Role of hydrogen on field emission from chemical vapor deposited diamond and nanocrystalline diamond powder

2000 ◽  
Vol 88 (6) ◽  
pp. 3667-3673 ◽  
Author(s):  
J. B. Cui ◽  
M. Stammler ◽  
J. Ristein ◽  
L. Ley
Keyword(s):  
Field Emission ◽  
Chemical Vapor ◽  
Diamond Powder ◽  
Nanocrystalline Diamond ◽  
Chemical Vapor Deposited

The Effect of Ion Implantation on Field Emission Property of Nanodiamond Films

2008 ◽  
Vol 8 (8) ◽  
pp. 4141-4145 ◽  
Author(s):  
Huang-Chin Chen ◽  
Umesh Palnitkar ◽  
Huan Niu ◽  
Hsiu-Fung Cheng ◽  
I-Nan Lin
Keyword(s):  
Ion Implantation ◽  
Field Emission ◽  
Structural Damage ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Nanocrystalline Diamond ◽  
Emission Measurement ◽  
Before And After ◽  
Nitrogen Ions ◽  
Nitrogen Ion

Nanocrystalline diamond films prepared by microwave plasma enhanced chemical vapor deposition (MPECVD) were implanted using 110 keV nitrogen ions under fluence ranging from 1013–1014 ions/cm2. Scanning Electron Microscopy (SEM) and Raman spectroscopy were used to analyze the changes in the surface of the films before and after ion implantation. Results show that with nitrogen ion implantation in nanocrystalline diamond film cause to decrease in diamond crystallinity. The field emission measurement shows a sharp increase in current density with increase in dose. The ion implantation also alters the turn on field. It is observed that the structural damage caused by ion implantation plays a significant role in emission behaviour of nanocrystalline diamonds.

Field emission conduction mechanisms in chemical vapor deposited diamond and diamondlike carbon films

1998 ◽  
Vol 72 (17) ◽  
pp. 2182-2184 ◽  
Author(s):  
Paul W. May ◽  
Stefan Höhn ◽  
Wang N. Wang ◽  
Neil A. Fox
Keyword(s):  
Field Emission ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Conduction Mechanisms ◽  
Chemical Vapor Deposited ◽  
Diamondlike Carbon

Electron Emission Properties of Si Field Emitter Arrays Coated With Nanocrystalline Diamond From Fullerene Precursors

1997 ◽  
Vol 498 ◽  
Author(s):  
T. G. McCauley ◽  
T. D. Corrigan ◽  
A. R. Krauss ◽  
O. Auciello ◽  
D. Zhou ◽  
...  
Keyword(s):  
Field Emission ◽  
Electron Emission ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Nanocrystalline Diamond ◽  
Threshold Field ◽  
Field Emitter ◽  
Effective Work ◽  
Field Emitter Arrays ◽  
Electron Field

ABSTRACTIn this paper, we report on a substantial lowering of the threshold field for electron field emission from Si field emitter arrays (FEA), which have been coated with a thin layer of nanocrystalline diamond by microwave plasma-assisted chemical vapor deposition (MPCVD) from fullerene (C60) and methane (CH4) precursors. The field emission characteristics were investigated and the emission sites imaged using photoelectron emission microscopy (PEEM). Electron emission from these Si FEAs coated with nanocrystalline diamond was observed at threshold fields as low as 3 V/μm, with effective work functions as low as 0.59 eV.

Simultaneous Field Emission and Photoemission Characterization of N-Doped CVD Diamond

1998 ◽  
Vol 509 ◽  
Author(s):  
Ryuichi Matsuda ◽  
Ken Okano ◽  
Bradford B. Pate
Keyword(s):  
Spatial Distribution ◽  
Kinetic Energy ◽  
Field Emission ◽  
Chemical Vapor ◽  
Emission Current Density ◽  
Cvd Diamond ◽  
Valence Band Maximum ◽  
Wide Range ◽  
Chemical Vapor Deposited ◽  
Emission Threshold

AbstractThe kinetic energy and spatial distribution of field electron emission from nitrogen (urea) doped, chemical vapor deposited (CVD) diamond films have been examined with simultaneous field emission and photoemission. A linear Fowler-Nordheim characteristic was measured over a wide range of currents. The field emission electrons originate from distinct areas of the flat sample. The dominant origin of field emission is due to electrons tunneling from near the valence band maximum. A time dependent fluctuation in the kinetic energy and spatial distribution of the emission is observed when the applied electric field (and hence emission current density) is increased well above the emission threshold.

Electron Field Emission from Chemical Vapor Deposited Diamond Films

1998 ◽  
Vol 145 (7) ◽  
pp. 2572-2576 ◽  
Author(s):  
A. N. Obraztsov ◽  
I. Yu. Pavlovsky ◽  
A. P. Volkov ◽  
E. V. Rakova ◽  
S. P. Nagovitsyn
Keyword(s):  
Field Emission ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Electron Field Emission ◽  
Chemical Vapor Deposited ◽  
Electron Field

Effect of surface roughness on field emission from chemical vapor deposited polycrystalline diamond

2001 ◽  
Vol 79 (9) ◽  
pp. 1288-1290 ◽  
Author(s):  
N. Koenigsfeld ◽  
R. Kalish ◽  
A. Cimmino ◽  
D. Hoxley ◽  
S. Prawer ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Field Emission ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
Chemical Vapor Deposited ◽  
Effect Of Surface
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