Effect of surface roughness on field emission from chemical vapor deposited polycrystalline diamond

2001 ◽  
Vol 79 (9) ◽  
pp. 1288-1290 ◽  
Author(s):  
N. Koenigsfeld ◽  
R. Kalish ◽  
A. Cimmino ◽  
D. Hoxley ◽  
S. Prawer ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Field Emission ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
Chemical Vapor Deposited ◽  
Effect Of Surface

Field-Emission Activation on Boron-Doped Chemical-Vapor-Deposited Polycrystalline Diamond Films

2002 ◽  
Vol 41 (Part 1, No. 5A) ◽  
pp. 3081-3084 ◽  
Author(s):  
Yang-Do Kim ◽  
Woon Choi ◽  
Chae-Hyun Wang ◽  
Toshihiro Ando ◽  
Hyeongtag Jeon ◽  
...  
Keyword(s):  
Field Emission ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
Boron Doped ◽  
Chemical Vapor Deposited

Fracture strength and toughness of chemical-vapor-deposited polycrystalline diamond films

2018 ◽  
Vol 44 (15) ◽  
pp. 17845-17851 ◽  
Author(s):  
Kang An ◽  
Liangxian Chen ◽  
Xiongbo Yan ◽  
Xin Jia ◽  
Jinlong Liu ◽  
...  
Keyword(s):  
Fracture Strength ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
Chemical Vapor Deposited ◽  
Strength And Toughness

Electron field emission from polycrystalline diamond films

2000 ◽  
Vol 15 (1) ◽  
pp. 212-217 ◽  
Author(s):  
Qing Zhang ◽  
S. F. Yoon ◽  
J. Ahn ◽  
Bo Gan ◽  
Rusli
Keyword(s):  
Surface Roughness ◽  
Field Emission ◽  
Concentration Ratio ◽  
Diamond Films ◽  
Polycrystalline Diamond ◽  
Electron Field Emission ◽  
Pure Hydrogen ◽  
Flow Ratio ◽  
Turn On ◽  
Electron Field

The influence of the carbon network structure of polycrystalline diamond films that were prepared from a mixture of H2, CH4, and N2 using microwave-enhanced plasma chemical vapor deposition on electron field emission has been systematically investigated. With increasing nitrogen gas flow ratio of [ N2]/[H2 + CH4 + N2], the film hardness and surface roughness of the as-grown films decreased, and the concentration ratio of amorphous sp2-bonded carbon clusters and mixed sp2−sp3 carbon structures to tetrahedrally bonded amorphous carbon phases increased. Correspondingly, the turn-on voltage for electron emission decreased. After the surface post-treatment by pure hydrogen plasma exposure, the concentration ratio was clearly found to have increased dramatically and the turn-on voltage decreased significantly for the films produced at small nitrogen flow ratio. Our results suggest that the influence of the concentration ratio on electron field emission is much more significant than that of the surface roughness of the polycrystalline diamond films studied in this paper.

Sign in / Sign up

Export Citation Format

Share Document