On the long pulse operation of an x-ray preionized, gas discharge pumped ArF excimer laser

1999 ◽  
Vol 75 (8) ◽  
pp. 1033-1035 ◽  
Author(s):  
L. Feenstra ◽  
H. M. J. Bastiaens ◽  
P. J. M. Peters ◽  
W. J. Witteman
Keyword(s):  
Excimer Laser ◽  
Gas Discharge ◽  
Pulse Operation ◽  
X Ray ◽  
Arf Excimer Laser ◽  
Long Pulse

Long pulse operation of an x-ray preionized molecular fluorine laser excited by a prepulse–main pulse system with a magnetic switch

1998 ◽  
Vol 72 (22) ◽  
pp. 2791-2793 ◽  
Author(s):  
H. M. J. Bastiaens ◽  
S. J. M. Peeters ◽  
X. Renard ◽  
P. J. M. Peters ◽  
W. J. Witteman
Keyword(s):  
Main Pulse ◽  
Pulse System ◽  
Magnetic Switch ◽  
Pulse Operation ◽  
X Ray ◽  
Long Pulse

Tungsten‐carbon multilayers for x‐ray optics prepared by ArF excimer‐laser‐induced chemical vapor deposition

1990 ◽  
Vol 68 (3) ◽  
pp. 1361-1363 ◽  
Author(s):  
Katsuhiko Mutoh ◽  
Yuka Yamada ◽  
Takashi Iwabuchi ◽  
Takeo Miyata
Keyword(s):  
Chemical Vapor Deposition ◽  
Excimer Laser ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Ray Optics ◽  
X Ray ◽  
Arf Excimer Laser

Ultrahigh-repetition-rate ArF excimer laser with long pulse duration for 193-nm lithography

2001 ◽  
Author(s):  
Kouji Kakizaki ◽  
Takashi Matsunaga ◽  
Yoichi Sasaki ◽  
Toyoharu Inoue ◽  
Satoshi Tanaka ◽  
...  
Keyword(s):  
Pulse Duration ◽  
Excimer Laser ◽  
Repetition Rate ◽  
Arf Excimer Laser ◽  
193 Nm ◽  
Long Pulse

Timing of the x-ray preionization of a discharge-pumped ArF excimer laser with different excitation circuits

1998 ◽  
Author(s):  
L. Feenstra ◽  
O. B. Hoekstra ◽  
Peter J. M. Peters ◽  
Wilhelmus J. Witteman
Keyword(s):  
Excimer Laser ◽  
X Ray ◽  
Arf Excimer Laser

X-Ray Photoemission Investigation of Excimer Laser Induced Etching of InP

1989 ◽  
Vol 158 ◽  
Author(s):  
R. Matz ◽  
J. Meiler ◽  
D. Haarer
Keyword(s):  
Gas Phase ◽  
Excimer Laser ◽  
Spatial Resolution ◽  
Etch Rate ◽  
Large Area ◽  
X Ray ◽  
Resolution Capability ◽  
Fundamental Understanding ◽  
Arf Excimer Laser ◽  
Laser Induced Etching

ABSTRACTArF excimer laser induced etching of InP in various etch gases (HBr, HCI, CI2) is discussed with regard to its spatial resolution capability. X-ray photoemission spectra and large-area etch rate measurements published before lead to fundamental understanding and interpretation of the characteristics of etched test structures. HBr and HCI require gas phase photodissociation. CI2' in contrast, has the advantage to react spontaneously.

scholarly journals Photochemical Micro-/Nano-Swelling of Silicone Rubber Induced by Long Pulse-Repetition Interval of an ArF Excimer Laser

2021 ◽  
Vol 2 (2) ◽  
pp. 116-124
Author(s):  
Masayuki Okoshi
Keyword(s):  
Excimer Laser ◽  
Silicone Rubber ◽  
Early Stage ◽  
Pulse Number ◽  
Pulse Repetition ◽  
Atomic Force ◽  
Arf Excimer Laser ◽  
Repetition Interval ◽  
193 Nm ◽  
Long Pulse

Long pulse-repetition intervals of 100 to 500 ms of a 193 nm ArF excimer laser successfully increased the height of the photochemical micro-/nano-swelling of silicone rubber, observed with a scanning electron microscope. The effect of the interval was seen despite the heating of the silicone rubber to 80 °C during laser irradiation. The height of the micro-/nano-swelling was saturated when the laser pulse number was 300 or greater, although each of the saturated heights of the micro-/nano-swelling formed by several pulse-repetition intervals was different. Thus, a second ArF excimer laser irradiated the growing micro-/nano-swelling before the saturation; the saturated height of the growing micro-/nano-swelling could be controlled by the pulse-repetition interval of the second ArF excimer laser. To examine the process of micro-/nano-swelling, an early stage of the growth was observed using an atomic force microscope; a dent structure of the micro-/nano-swelling was clearly recognized. In addition, a needle-like structure of the micro-/nano-swelling could be formed when silica glass microspheres were sparsely aligned.

Toward a high-average-power and debris-free soft x-ray source for microlithography pumped by a long-pulse excimer laser

1999 ◽  
Author(s):  
Sarah Bollanti ◽  
Paolo Di Lazzaro ◽  
Francesco Flora ◽  
Tommaso Letardi ◽  
Alessandro Marinai ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Average Power ◽  
High Average Power ◽  
X Ray ◽  
Pulse Excimer Laser ◽  
Long Pulse
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