Timing of the x-ray preionization of a discharge-pumped ArF excimer laser with different excitation circuits

Author(s):  
L. Feenstra ◽  
O. B. Hoekstra ◽  
Peter J. M. Peters ◽  
Wilhelmus J. Witteman
1999 ◽  
Vol 75 (8) ◽  
pp. 1033-1035 ◽  
Author(s):  
L. Feenstra ◽  
H. M. J. Bastiaens ◽  
P. J. M. Peters ◽  
W. J. Witteman

1990 ◽  
Vol 68 (3) ◽  
pp. 1361-1363 ◽  
Author(s):  
Katsuhiko Mutoh ◽  
Yuka Yamada ◽  
Takashi Iwabuchi ◽  
Takeo Miyata

1989 ◽  
Vol 158 ◽  
Author(s):  
R. Matz ◽  
J. Meiler ◽  
D. Haarer

ABSTRACTArF excimer laser induced etching of InP in various etch gases (HBr, HCI, CI2) is discussed with regard to its spatial resolution capability. X-ray photoemission spectra and large-area etch rate measurements published before lead to fundamental understanding and interpretation of the characteristics of etched test structures. HBr and HCI require gas phase photodissociation. CI2' in contrast, has the advantage to react spontaneously.


1996 ◽  
Vol 451 ◽  
Author(s):  
T. Shimizu ◽  
M. Murahara

ABSTRACTA Fluorocarbon resin surface was selectively modified by irradiation with a ArF laser beam through a thin layer of NaAlO2, B(OH)3, or H2O solution to give a hydrophilic property. As a result, with low fluence, the surface was most effectively modified with the NaAlO2 solution among the three solutions. However, the contact angle in this case changed by 10 degrees as the fluence changed only 1mJ/cm2. When modifying a large area of the surface, high resolution displacement could not be achieved because the laser beam was not uniform in displacing functional groups. Thus, the laser fluence was successfully made uniform by homogenizing the laser beam; the functional groups were replaced on the fluorocarbon resin surface with high resolution, which was successfully modified to be hydrophilic by distributing the laser fluence uniformly.


1998 ◽  
Vol 72 (12) ◽  
pp. 1472-1474 ◽  
Author(s):  
Takashi Sugino ◽  
Hideaki Ninomiya ◽  
Junji Shirafuji ◽  
Koichiro Matsuda

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