scholarly journals Bonding constraints and defect formation at interfaces between crystalline silicon and advanced single layer and composite gate dielectrics

1999 ◽  
Vol 74 (14) ◽  
pp. 2005-2007 ◽  
Author(s):  
G. Lucovsky ◽  
Y. Wu ◽  
H. Niimi ◽  
V. Misra ◽  
J. C. Phillips
2011 ◽  
Vol 1363 ◽  
Author(s):  
G.J. Ackland ◽  
T.P.C. Klaver ◽  
D.J. Hepburn

ABSTRACTFirst principles calculations have given a new insight into the energies of point defects in many different materials, information which cannot be readily obtained from experiment. Most such calculations are done at zero Kelvin, with the assumption that finite temperature effects on defect energies and barriers are small. In some materials, however, the stable crystal structure of interest is mechanically unstable at 0K. In such cases, alternate approaches are needed. Here we present results of first principles calculations of austenitic iron using the VASP code. We determine an appropriate reference state for collinear magnetism to be the antiferromagnetic (001) double-layer (AFM-d) which is both stable and lower in energy than other possible models for the low temperature limit of paramagnetic fcc iron. Another plausible reference state is the antiferromagnetic (001) single layer (AFM-1). We then consider the energetics of dissolving typical alloying impurities (Ni, Cr) in the materials, and their interaction with point defects typical of the irradiated environment. We show that the calculated defect formation energies have fairly high dependence on the reference state chosen: in some cases this is due to instability of the reference state, a problem which does not seem to apply to AFM-d and AFM-1. Furthermore, there is a correlation between local free volume magnetism and energetics. Despite this, a general picture emerge that point defects in austenitic iron have geometries similar to those in simpler, non-magnetic, thermodynamically stable FCC metals. The defect energies are similar to those in BCC iron. The effect of substitutional Ni and Cr on defect properties is weak, rarely more than tenths of eV, so it is unlikely that small amounts of Ni and Cr will have a significant effect on the radiation damage in austenitic iron at high temperatures.


2005 ◽  
Vol 864 ◽  
Author(s):  
J. Schmidt ◽  
K. Bothe ◽  
D. Macdonald ◽  
J. Adey ◽  
R. Jones ◽  
...  

AbstractCarrier lifetime degradation in crystalline silicon solar cells under illumination with white light is a frequently observed phenomenon. Two main causes of such degradation effects have been identified in the past, both of them being electronically driven and both related to the most common acceptor element, boron, in silicon: (i) the dissociation of iron-boron pairs and (ii) the formation of recombination-active boron-oxygen complexes. While the first mechanism is particularly relevant in metal-contaminated solar-grade multicrystalline silicon materials, the latter process is important in monocrystalline Czochralski-grown silicon, rich in oxygen. This paper starts with a short review of the characteristic features of the two processes. We then briefly address the effect of iron-boron dissociation on solar cell parameters. Regarding the boron-oxygen-related degradation, the current status of the physical understanding of the defect formation process and the defect structure are presented. Finally, we discuss different strategies for effectively avoiding the degradation.


2013 ◽  
Vol 1540 ◽  
Author(s):  
Fleur Legrain ◽  
Oleksandr I. Malyi ◽  
Teck L. Tan ◽  
Sergei Manzhos

ABSTRACTWe show in a theoretical density functional theory study that amorphous Si (a-Si) has more favorable energetics for Mg storage compared to crystalline Si (c-Si). Specifically, Mg and Li insertion is compared in a model a-Si simulation cell. Multiple sites for Mg insertion with a wide range of binding energies are identified. For many sites, Mg defect formation energies are negative, whereas they are positive in c-Si. Moreover, while clustering in c-Si destabilizes the insertion sites (by about 0.1/0.2 eV per atom for nearest-neighbor Li/Mg), it is found to stabilize some of the insertion sites for both Li (by up to 0.27 eV) and Mg (by up to 0.35 eV) in a-Si. This could have significant implications on the performance of Si anodes in Mg batteries.


2002 ◽  
Vol 01 (05n06) ◽  
pp. 603-609
Author(s):  
XINFAN HUANG ◽  
XIAOWEI WANG ◽  
FENG QIAO ◽  
LEYI ZHU ◽  
WEI LI ◽  
...  

We employ the method of phase-modulated KrF excimer pulsed laser interference crystallization to fabricate nanometer-sized crystalline silicon with two-dimensional patterned distribution within the ultra-thin amouphous Si:H single-layer. The local phase transition occurs in ultra-thin a-Si:H film after laser interference crystallization under proper energy density. The results of atomic force microscopy, Raman scattering spectroscopy, cross-section transmission electron microscopy and scanning electron microscopy demonstrate that Si nanocrystallites are formed within the initial a-Si:H single-layer, selectively located in the discal regions with the diameter of 250 nm and patterned with the same 2D periodicity of 2.0 μm as the phase-shifting grating. The results demonstrate that the present method can be used to fabricate patterned nc-Si films for device applications.


1994 ◽  
Vol 342 ◽  
Author(s):  
V. Misra ◽  
X-L. Xu ◽  
J.J. Wortman

ABSTRACTTo meet the stringent demands of high quality gate performance in advanced devices, a more robust gate dielectric is needed. A stacked structure consisting of thermal oxide and deposited oxide is a potential candidate since it offers certain advantages over single layer oxides such as 1) reduced defect density, 2) reduced stress at the SiO2/Si interface due to stress compensation between the thermal and the deposited oxide, 3) less silicon consumption and 4) reduced thermal budget. In this study, stacked oxides consisting of RTO and RTCVD oxides are characterized. In contrast to other studies which use conventional LPCVD methods to form the top oxide, these stacked oxides have the advantages of rapid thermal and in-situ processing, which produces excellent bulk and interfacial properties. Electrical characterization has shown that these stacked oxides have superior performance compared to single layer furnace or deposited oxides.


2002 ◽  
Vol 737 ◽  
Author(s):  
Xiaowei Wang ◽  
Feng Qiao ◽  
Leyi Zhu ◽  
Wei Li ◽  
Jian Li ◽  
...  

ABSTRACTWe employ the method of phase-modulated KrF excimer pulsed laser interference crystallization to fabricate nanometer-sized crystalline silicon (nc-Si) with the two-dimensional (2D) patterned distribution within the ultra-thin a-Si:H single-layer. The local crystallization occurs after interference laser irradiation under proper energy density. The results of atomic force microscopy, Raman scattering spectroscopy, cross-section transmission electron microscopy and scanning electron microscopy demonstrate that Si nano-crystallites are formed within the initial a-Si:H single-layer, selectively located in the discal regions with the diameter of 350 nm and patterned with the same 2D periodicity of 2.0 μm as the phase-shifting grating. The results show that the present method can be used to fabricate patterned nc-Si films for device applications.


2000 ◽  
Vol 609 ◽  
Author(s):  
H. Povolny ◽  
P. Agarwal ◽  
S. Han ◽  
X. Deng

ABSTRACTA-SiGe n-i-p solar cells with i-layer deposited via plasma enhanced chemical vapor deposition (PECVD) with a germane to disilane ratio of 0.72 and hydrogen dilution R=(H2 flow)/(GeH4+Si2H6 flow) values of 1.7, 10, 30, 50, 120, 180 and 240 were deposited on stainless steel substrates. This germane to disilane ratio is what we typically use for the i-layer in the bottom cell of our standard triple-junction solar cells. Solar cell current-voltage curves (J-V) and quantum efficiency (QE) were measured for these devices. Light soaking tests were performed for these devices under 1 sun light intensity at 50° C. While device with R=30 showed the highest initial efficiency, the device with R=120 exhibit higher stabilized efficiency after 1000 hours of light soaking.Single-layer a-SiGe films (∼500 nm thick) were deposited under the same conditions as the i-layer of these devices on a variety of substrates including 7059 glass, crystalline silicon, and stainless steel for visible-IR transmission spectroscopy, FTIR, and hydrogen effusion studies. It is interesting to note 1) the H content in the film decreased with increasing R based on both the IR and H effusion measurements, and 2) while the H content changes significantly with different R, the change in Eg is relatively small. This is most likely due to a change in Ge content in the film for different R.


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