Diagnostic technique for measuring plasma parameters near surfaces in radio frequency discharges

1998 ◽  
Vol 73 (19) ◽  
pp. 2730-2732 ◽  
Author(s):  
Shahid Rauf ◽  
Mark J. Kushner
Keyword(s):  
Radio Frequency ◽  
Diagnostic Technique ◽  
Plasma Parameters ◽  
Radio Frequency Discharges

A novel ex situ diagnostic technique for characterizing harmonics in radio frequency discharges

2020 ◽  
Vol 91 (9) ◽  
pp. 094705
Author(s):  
Arti Rawat ◽  
A. Ganguli ◽  
Ramesh Narayanan ◽  
R. D. Tarey
Keyword(s):  
Radio Frequency ◽  
Diagnostic Technique ◽  
Ex Situ ◽  
Radio Frequency Discharges

A self-consistent fluid model for radio-frequency discharges in SiH4–H2 compared to experiments

1997 ◽  
Vol 82 (5) ◽  
pp. 2060-2071 ◽  
Author(s):  
G. J. Nienhuis ◽  
W. J. Goedheer ◽  
E. A. G. Hamers ◽  
W. G. J. H. M. van Sark ◽  
J. Bezemer
Keyword(s):  
Radio Frequency ◽  
Fluid Model ◽  
Self Consistent ◽  
Radio Frequency Discharges

Excitation in radio-frequency discharges

1963 ◽  
Vol 19 (8) ◽  
pp. 1309-1317 ◽  
Author(s):  
R. Mavrodineanu ◽  
R.C. Hughes
Keyword(s):  
Radio Frequency ◽  
Radio Frequency Discharges

scholarly journals Space and phase resolved plasma parameters in an industrial dual-frequency capacitively coupled radio-frequency discharge

2007 ◽  
Vol 40 (22) ◽  
pp. 7008-7018 ◽  
Author(s):  
J Schulze ◽  
T Gans ◽  
D O'Connell ◽  
U Czarnetzki ◽  
A R Ellingboe ◽  
...  
Keyword(s):  
Radio Frequency ◽  
Dual Frequency ◽  
Plasma Parameters ◽  
Capacitively Coupled ◽  
Radio Frequency Discharge

scholarly journals Uses of radio emission spectroscopy for non-contact and in situ diagnostics of low pressure radio frequency plasma processing

2021 ◽  
Author(s):  
Rajani K. Vijayaraghavan ◽  
Sean Kelly ◽  
David Coates ◽  
Cezar Gaman ◽  
Niall MacGearailt ◽  
...  
Keyword(s):  
Radio Emission ◽  
Radio Frequency ◽  
Emission Spectroscopy ◽  
Near Field ◽  
Plasma Processing ◽  
Diagnostic Technique ◽  
Primary Source ◽  
Low Pressure ◽  
Chamber Pressure ◽  
Rf Plasma

Abstract We demonstrate that a passive non-contact diagnostic technique, radio emission spectroscopy (RES), provides a sensitive monitor of currents in a low pressure radio frequency (RF) plasma. A near field magnetic loop antenna was used to capture RF emissions from the plasma without perturbing it. The analysis was implemented for a capacitively coupled RF plasma with an RF supply at a frequency of 13.56 MHz. Real-time measurements are captured in scenarios relevant to contemporary challenges faced during semiconductor fabrication (e.g. window coating and wall disturbance). Exploration of the technique for key equipment parameters including applied RF power, chamber pressure, RF bias frequencies and chamber wall cleanliness shows sensitive and repeatable function. In particular, the induced RES signal was found to vary sensitively to pressure changes and we were able to detect pressure and power variations as low as ~2.5 %/mtorr and ~3.5 %/watt, respectively, during the plasma processing during a trial generic plasma process. Finally, we explored the ability of RES to monitor the operation of a multiple frequency low-pressure RF plasma system (f1 = 2 MHz, f2 = 162 MHz) and intermixing products which suggests strongly that the plasma sheaths are the primary source of this non-linear diode mixing effect.

Modeling of electronegative radio-frequency discharges

1991 ◽  
Vol 19 (2) ◽  
pp. 122-129 ◽  
Author(s):  
M. Meyyappan ◽  
T.R. Govindan
Keyword(s):  
Radio Frequency ◽  
Radio Frequency Discharges

scholarly journals Heavy-particle induced secondary electrons in capacitive radio frequency discharges driven by tailored voltage waveforms

2019 ◽  
Vol 126 (4) ◽  
pp. 043303 ◽  
Author(s):  
A. Derzsi ◽  
B. Horváth ◽  
I. Korolov ◽  
Z. Donkó ◽  
J. Schulze
Keyword(s):  
Radio Frequency ◽  
Heavy Particle ◽  
Secondary Electrons ◽  
Radio Frequency Discharges
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