scholarly journals Erratum: “Spectra analysis of annealed Hg1−xCdxTe molecular beam epitaxial films” [Appl. Phys. Lett. 73, 1376 (1998)]

1998 ◽  
Vol 73 (15) ◽  
pp. 2221-2221
Author(s):  
Biao Li ◽  
Yan Wu ◽  
Yongsheng Gui ◽  
Hongjuan Ye ◽  
Yong Chang ◽  
...  
1998 ◽  
Vol 73 (10) ◽  
pp. 1376-1378 ◽  
Author(s):  
Biao Li ◽  
Yan Wu ◽  
Yongsheng Gui ◽  
Hongjuan Ye ◽  
Yong Chang ◽  
...  

1975 ◽  
Vol 14 (4) ◽  
pp. 581-582 ◽  
Author(s):  
Mitsuru Naganuma ◽  
Kiichi Kamimura ◽  
Kiyoshi Takahashi ◽  
Yoshio Sakai

1987 ◽  
Vol 51 (11) ◽  
pp. 811-813 ◽  
Author(s):  
W. Cabanski ◽  
M. Schulz ◽  
E. Kasper ◽  
H. J. Herzog

1975 ◽  
Vol 27 (6) ◽  
pp. 342-344 ◽  
Author(s):  
Mitsuru Naganuma ◽  
Kiyoshi Takahashi

1990 ◽  
Vol 202 ◽  
Author(s):  
Stéphane Ethier ◽  
Laurent J. Lewis

ABSTRACTWe use molecular-dynamics simulations to study the growth of pure Si, Si0.5Ge0.5 and pure Ge on the reconstructed (100) surface of Si. The atoms interact with one another via effective potentials of the Stillinger-Weber form with parameters adjusted such as to describe all types of triplet interactions. Motivated by recent experimental studies of molecular-beam epitaxial films,1 we examine in particular the structure of the deposits for various substrate temperatures. We also examine the relaxation of the structure resulting from high-temperature annealing. Finally, we investigate the interdiffusion of the species at the substrate-deposit interface.


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