Microwave plasma nitridation of silicon dioxide on strained Si

1998 ◽  
Vol 73 (11) ◽  
pp. 1559-1561 ◽  
Author(s):  
L. K. Bera ◽  
H. D. Banerjee ◽  
S. K. Ray ◽  
M. Mukhopadhyay ◽  
C. K. Maiti
Keyword(s):  
Silicon Dioxide ◽  
Microwave Plasma ◽  
Strained Si ◽  
Plasma Nitridation

Depth Profile of Nitrogen Atoms in Silicon Oxynitride Films Formed by Low-Electron-Temperature Microwave Plasma Nitridation

2010 ◽  
Vol 49 (9) ◽  
pp. 091301 ◽  
Author(s):  
Shigemi Murakawa ◽  
Shu-ichi Ishizuka ◽  
Toshio Nakanishi ◽  
Tomoyuki Suwa ◽  
Akinobu Teramoto ◽  
...  
Keyword(s):  
Electron Temperature ◽  
Depth Profile ◽  
Microwave Plasma ◽  
Silicon Oxynitride ◽  
Plasma Nitridation

Silicon dioxide deposition in a microwave plasma reactor

1999 ◽  
Vol 116-119 ◽  
pp. 868-873 ◽  
Author(s):  
N Benissad ◽  
C Boisse-Laporte ◽  
C Vallée ◽  
A Granier ◽  
A Goullet
Keyword(s):  
Silicon Dioxide ◽  
Microwave Plasma ◽  
Plasma Reactor

Mechanism of Silicon Dioxide Decoupled Plasma Nitridation

2006 ◽  
Vol 45 (No. 15) ◽  
pp. L413-L415
Author(s):  
Sang Woo Lim ◽  
Tien-Ying Luo ◽  
Jack Jiang
Keyword(s):  
Silicon Dioxide ◽  
Plasma Nitridation

Microwave Plasma Etching of Silicon Dioxide for Half-Micron ULSIs

1989 ◽  
Author(s):  
Kazuo NOJIRI ◽  
Eri IGUCHI ◽  
Koichiro KAWAMURA ◽  
Kazuya KADOTA
Keyword(s):  
Silicon Dioxide ◽  
Plasma Etching ◽  
Microwave Plasma
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