Electron field emission characteristics of planar diamond film array synthesized by chemical vapor deposition process

J. S. Lee; K. S. Liu; I. N. Lin

doi:10.1063/1.119607

Electron field emission characteristics of planar diamond film array synthesized by chemical vapor deposition process

Applied Physics Letters ◽

10.1063/1.119607 ◽

1997 ◽

Vol 71 (4) ◽

pp. 554-556 ◽

Cited By ~ 25

Author(s):

J. S. Lee ◽

K. S. Liu ◽

I. N. Lin

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Diamond Film ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Emission Characteristics ◽

Electron Field Emission ◽

Electron Field

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Electron field emission properties of nanodiamonds synthesized by the chemical vapor deposition process

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1349207 ◽

2001 ◽

Vol 19 (3) ◽

pp. 975 ◽

Cited By ~ 11

Author(s):

Yu-Che Yu ◽

Jin-Hua Huang ◽

I-Nan Lin

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Electron Field Emission ◽

Emission Properties ◽

Field Emission Properties ◽

Electron Field ◽

Electron Field Emission Properties

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Synthesis of hybrid diamond films via two-step microwave enhanced chemical vapor deposition process for enhancing the electron field emission properties

Diamond and Related Materials ◽

10.1016/j.diamond.2015.12.018 ◽

2016 ◽

Vol 63 ◽

pp. 211-217

Author(s):

Adhimoorthy Saravanan ◽

Bohr-Ran Huang ◽

Divinah Manoharan ◽

Chung-Li Dong ◽

I-Nan Lin

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Deposition Process ◽

Electron Field Emission ◽

Field Emission Properties ◽

Electron Field ◽

Electron Field Emission Properties

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Development of diamond cathode materials for enhancing the electron field emission and plasma characteristics using two-step microwave plasma enhanced chemical vapor deposition process

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.4864067 ◽

2014 ◽

Vol 32 (2) ◽

pp. 021202 ◽

Cited By ~ 6

Author(s):

Shiu-Cheng Lou ◽

Chulung Chen ◽

Srinivasu Kunuku ◽

Keh-Chyang Leou ◽

Chi-Young Lee ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Cathode Materials ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Process ◽

Electron Field Emission ◽

Electron Field ◽

Plasma Characteristics

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Growth and electron field emission characteristics of nanodiamond films deposited in N[sub 2]/CH[sub 4]/H[sub 2] microwave plasma-enhanced chemical vapor deposition

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1503780 ◽

2002 ◽

Vol 20 (5) ◽

pp. 1982 ◽

Cited By ~ 9

Author(s):

S. G. Wang ◽

Qing Zhang ◽

S. F. Yoon ◽

J. Ahn ◽

Q. Wang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Emission Characteristics ◽

Electron Field Emission ◽

Electron Field

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Electron Field Emission from a-C:F:N Film Deposited by Inductively Coupled Plasma Chemical Vapor Deposition

SID Symposium Digest of Technical Papers ◽

10.1889/1.1833829 ◽

1998 ◽

Vol 29 (1) ◽

pp. 601

Author(s):

Suk Jae Chung ◽

Eun Jung Han ◽

Jong Hyun Moon ◽

Myung Hwan Oh ◽

Jin Jang

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Electron Field Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Electron Field

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Microstructure and electron field emission study of diamond nanorod decorated a-SiO2 nanowires by microwave Ar–CH4/H2 plasma chemical vapor deposition with addition of N2

Diamond and Related Materials ◽

10.1016/j.diamond.2009.02.021 ◽

2009 ◽

Vol 18 (5-8) ◽

pp. 865-869 ◽

Cited By ~ 6

Author(s):

M.K. Singh ◽

E. Titus ◽

M.G. Willinger ◽

J.C. Madaleno ◽

J. Grácioa

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Chemical Vapor ◽

Electron Field Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Electron Field ◽

Sio2 Nanowires ◽

Emission Study

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Enhanced field emission characteristics of nitrogen-doped carbon nanotube films grown by microwave plasma enhanced chemical vapor deposition process

Thin Solid Films ◽

10.1016/j.tsf.2006.07.016 ◽

2006 ◽

Vol 515 (4) ◽

pp. 1851-1856 ◽

Cited By ~ 73

Author(s):

Sanjay K. Srivastava ◽

V.D. Vankar ◽

D.V. Sridhar Rao ◽

Vikram Kumar

Keyword(s):

Chemical Vapor Deposition ◽

Carbon Nanotube ◽

Field Emission ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Process ◽

Emission Characteristics ◽

Nitrogen Doped ◽

Nitrogen Doped Carbon

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Chemical vapor deposition of a-CNx:H films for electron field emission using band supermagnetron plasma

Journal of Physics Conference Series ◽

10.1088/1742-6596/518/1/012004 ◽

2014 ◽

Vol 518 ◽

pp. 012004 ◽

Cited By ~ 2

Author(s):

H Kinoshita ◽

S Yagi

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Chemical Vapor ◽

Electron Field Emission ◽

Electron Field

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Comparative study on catalyst-free formation and electron field emission of carbon nanotips and nanotubes grown by chemical vapor deposition

Applied Surface Science ◽

10.1016/j.apsusc.2013.02.030 ◽

2013 ◽

Vol 273 ◽

pp. 268-272 ◽

Cited By ~ 2

Author(s):

B.B. Wang ◽

K. Zheng ◽

R.W. Shao

Keyword(s):

Chemical Vapor Deposition ◽

Comparative Study ◽

Field Emission ◽

Vapor Deposition ◽

Chemical Vapor ◽

Electron Field Emission ◽

Catalyst Free ◽

Electron Field

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Electron field emission from undoped polycrystalline diamond particles synthesized by microwave-plasma chemical vapor deposition

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3670988 ◽

2012 ◽

Vol 30 (1) ◽

pp. 011204 ◽

Cited By ~ 11

Author(s):

Kenji Nose ◽

Ryuhei Fujita ◽

Masao Kamiko ◽

Yoshitaka Mitsuda

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Polycrystalline Diamond ◽

Electron Field Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Electron Field

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