Electron Field Emission from a-C:F:N Film Deposited by Inductively Coupled Plasma Chemical Vapor Deposition

Suk Jae Chung; Eun Jung Han; Jong Hyun Moon; Myung Hwan Oh; Jin Jang

doi:10.1889/1.1833829

Electron Field Emission from a-C:F:N Film Deposited by Inductively Coupled Plasma Chemical Vapor Deposition

SID Symposium Digest of Technical Papers ◽

10.1889/1.1833829 ◽

1998 ◽

Vol 29 (1) ◽

pp. 601

Author(s):

Suk Jae Chung ◽

Eun Jung Han ◽

Jong Hyun Moon ◽

Myung Hwan Oh ◽

Jin Jang

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Electron Field Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Electron Field

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Microstructure and electron field emission study of diamond nanorod decorated a-SiO2 nanowires by microwave Ar–CH4/H2 plasma chemical vapor deposition with addition of N2

Diamond and Related Materials ◽

10.1016/j.diamond.2009.02.021 ◽

2009 ◽

Vol 18 (5-8) ◽

pp. 865-869 ◽

Cited By ~ 6

Author(s):

M.K. Singh ◽

E. Titus ◽

M.G. Willinger ◽

J.C. Madaleno ◽

J. Grácioa

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Chemical Vapor ◽

Electron Field Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Electron Field ◽

Sio2 Nanowires ◽

Emission Study

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Electron field emission from undoped polycrystalline diamond particles synthesized by microwave-plasma chemical vapor deposition

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3670988 ◽

2012 ◽

Vol 30 (1) ◽

pp. 011204 ◽

Cited By ~ 11

Author(s):

Kenji Nose ◽

Ryuhei Fujita ◽

Masao Kamiko ◽

Yoshitaka Mitsuda

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Polycrystalline Diamond ◽

Electron Field Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Electron Field

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Electron field emission from carbon nanoparticles prepared by microwave-plasma chemical-vapor deposition

Applied Physics Letters ◽

10.1063/1.1361286 ◽

2001 ◽

Vol 78 (15) ◽

pp. 2226-2228 ◽

Cited By ~ 44

Author(s):

J. Yu ◽

E. G. Wang ◽

X. D. Bai

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Carbon Nanoparticles ◽

Microwave Plasma ◽

Chemical Vapor ◽

Electron Field Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Electron Field

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High voltage AlGaN/GaN Schottky barrier diode employing the inductively coupled plasma-chemical vapor deposition SiO2 passivation

2007 7th Internatonal Conference on Power Electronics ◽

10.1109/icpe.2007.4692351 ◽

2007 ◽

Author(s):

Young-Hwan Choi ◽

Jiyong Lim ◽

Kyu-Heon Cho ◽

Min-Koo Han

Keyword(s):

Chemical Vapor Deposition ◽

Schottky Barrier ◽

High Voltage ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Schottky Barrier Diode ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Organo-Functionalization of Silicon Nanocrystals Synthesized by Inductively Coupled Plasma Chemical Vapor Deposition

Bulletin of the Korean Chemical Society ◽

10.1002/bkcs.10758 ◽

2016 ◽

Vol 37 (5) ◽

pp. 705-712

Author(s):

Don-Sung Lee ◽

Dong-Hoe Choe ◽

Seung-Wan Yoo ◽

Jung-Hyung Kim ◽

Hyun-Dam Jeong

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Silicon Nanocrystals ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Exploring High Refractive Index Silicon-Rich Nitride Films by Low-Temperature Inductively Coupled Plasma Chemical Vapor Deposition and Applications for Integrated Waveguides

ACS Applied Materials & Interfaces ◽

10.1021/acsami.5b06329 ◽

2015 ◽

Vol 7 (39) ◽

pp. 21884-21889 ◽

Cited By ~ 45

Author(s):

Doris K. T. Ng ◽

Qian Wang ◽

Ting Wang ◽

Siu-Kit Ng ◽

Yeow-Teck Toh ◽

...

Keyword(s):

Refractive Index ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

High Refractive Index ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Non-catalytic direct synthesis of graphene on Si (111) wafers by using inductively-coupled plasma chemical vapor deposition

Journal of the Korean Physical Society ◽

10.3938/jkps.69.536 ◽

2016 ◽

Vol 69 (4) ◽

pp. 536-540

Author(s):

Sung Won Hwang ◽

Hyunho Shin ◽

Bongsoo Lee ◽

Suk-Ho Choi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Direct Synthesis ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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High-density inductively coupled plasma chemical vapor deposition of silicon nitride for solar cell application

Solar Energy Materials and Solar Cells ◽

10.1016/s0927-0248(02)00053-3 ◽

2002 ◽

Vol 74 (1-4) ◽

pp. 97-105 ◽

Cited By ~ 22

Author(s):

I.O Parm ◽

K Kim ◽

D.G Lim ◽

J.H Lee ◽

J.H Heo ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Solar Cell ◽

Silicon Nitride ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Solar Cell Application ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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The effect of r.f. substrate bias on the properties of carbon nitride films produced by an inductively coupled plasma chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2004.08.134 ◽

2005 ◽

Vol 193 (1-3) ◽

pp. 152-156 ◽

Cited By ~ 9

Author(s):

H.Y. Lee ◽

D.K. Lee ◽

D.H. Kang ◽

J.J. Lee ◽

J.H. Joo

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Carbon Nitride ◽

Chemical Vapor ◽

Substrate Bias ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Inductively coupled plasma chemical vapor deposition silicon nitride for passivation of In 0.83 Ga 0.17 As photodiodes

Infrared Physics & Technology ◽

10.1016/j.infrared.2014.06.003 ◽

2014 ◽

Vol 67 ◽

pp. 197-201 ◽

Cited By ~ 8

Author(s):

Ming Shi ◽

Xiumei Shao ◽

Hengjing Tang ◽

Tao Li ◽

Yunji Wang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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