Reliability of Hall effect measurements on chemical vapor deposited polycrystalline B‐doped diamond films

1996 ◽  
Vol 68 (26) ◽  
pp. 3784-3786 ◽  
Author(s):  
J. T. Huang ◽  
W. H. Guo ◽  
J. Hwang ◽  
H. Chang
2003 ◽  
Vol 82 (13) ◽  
pp. 2074-2076 ◽  
Author(s):  
Kazushi Nakazawa ◽  
Minoru Tachiki ◽  
Hiroshi Kawarada ◽  
Aki Kawamura ◽  
Kenji Horiuchi ◽  
...  

1990 ◽  
Vol 5 (8) ◽  
pp. 1591-1594 ◽  
Author(s):  
A. V. Hetherington ◽  
C. J. H. Wort ◽  
P. Southworth

The crystalline perfection of microwave plasma assisted chemical vapor deposited (MPACVD) diamond films grown under various conditions has been examined by TEM. Most CVD diamond films thus far reported contain a high density of defects, predominantly twins and stacking faults on {111} planes. We show that under appropriate growth conditions, these planar defects are eliminated from the center of the crystallites, and occur only at grain boundaries where the growing crystallites meet.


2018 ◽  
Vol 44 (15) ◽  
pp. 17845-17851 ◽  
Author(s):  
Kang An ◽  
Liangxian Chen ◽  
Xiongbo Yan ◽  
Xin Jia ◽  
Jinlong Liu ◽  
...  

1992 ◽  
Vol 31 (Part 2, No.1A/B) ◽  
pp. L4-L6 ◽  
Author(s):  
Yasuaki Muto ◽  
Takashi Sugino ◽  
Koji Kobashi ◽  
Junji Shirafuji

2008 ◽  
Vol 31 (1) ◽  
pp. 46-53 ◽  
Author(s):  
Baratunde A. Cola ◽  
Ratnakar Karru ◽  
Changrui Cheng ◽  
Xianfan Xu ◽  
Timothy S. Fisher

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