Removal of hydrogen from the base of carbon‐doped In0.49Ga0.51P/GaAs heterojunction bipolar transistors by ex situ annealing and the effects on device characteristics

1996 ◽  
Vol 68 (7) ◽  
pp. 982-984 ◽  
Author(s):  
Q. J. Hartmann ◽  
H. Hwangbo ◽  
A. Yung ◽  
D. A. Ahmari ◽  
M. T. Fresina ◽  
...  
1994 ◽  
Vol 338 ◽  
Author(s):  
F. Ren ◽  
C. R. Abernathy ◽  
S. N. G. Chu ◽  
J. R. Lothian ◽  
S. J. Pearton

ABSTRACTCarbon-doped base GaAs/AlGaAs HBTs display current-induced decreases in dc gain which are correlated with the amount of hydrogen incorporated in the base layer during growth by Metalorganic Molecular Beam Epitaxy (MOMBE). During device operation, minority carrier injection induced debonding of hydrogen from neutral C-H complexes leads to an increase in effective base doping level and therefore to a decrease in gain. Post-growth in-situ or ex-situ annealing eliminates this effect by breaking up the C-H complexes. Properly designed HBTs are stable even for very high collector current densities (105 A · cm−2)


1992 ◽  
Vol 61 (9) ◽  
pp. 1092-1094 ◽  
Author(s):  
C. R. Abernathy ◽  
F. Ren ◽  
P. W. Wisk ◽  
S. J. Pearton ◽  
R. Esagui

1994 ◽  
Vol 41 (1) ◽  
pp. 19-25 ◽  
Author(s):  
B.W.-P. Hong ◽  
Jong-In Song ◽  
C.J. Palmstrom ◽  
B. Van der Gaag ◽  
Kyung-Bae Chough ◽  
...  

1994 ◽  
Author(s):  
Jun-ichi SHIRAKASHI ◽  
Toshiaki AZUMA ◽  
Fumihiko FUKUCHI ◽  
Makoto KONAGAI ◽  
Kiyoshi TAKAHASHI

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