Fabrication of highly oriented Si:SiO2 nanoparticles using low energy oxygen ion implantation during Si molecular beam epitaxy

1996 ◽  
Vol 68 (16) ◽  
pp. 2249-2251 ◽  
Author(s):  
Yukari Ishikawa ◽  
N. Shibata ◽  
S. Fukatsu
Keyword(s):  
Molecular Beam Epitaxy ◽  
Ion Implantation ◽  
Molecular Beam ◽  
Low Energy ◽  
Oxygen Ion ◽  
Oxygen Ion Implantation

Analysis of thin‐film silicon‐on‐insulator structures formed by low‐energy oxygen ion implantation

1991 ◽  
Vol 70 (7) ◽  
pp. 3605-3612 ◽  
Author(s):  
Y. Li ◽  
J. A. Kilner ◽  
A. K. Robinson ◽  
P. L. F. Hemment ◽  
C. D. Marsh
Keyword(s):  
Thin Film ◽  
Ion Implantation ◽  
Low Energy ◽  
Silicon On Insulator ◽  
Oxygen Ion ◽  
Thin Film Silicon ◽  
Oxygen Ion Implantation

Surface characteristics of a dental implant modified by low energy oxygen ion implantation

2019 ◽  
Vol 365 ◽  
pp. 208-213 ◽  
Author(s):  
Zeng Lin ◽  
Shao-Jie Li ◽  
Fei Sun ◽  
De-Chun Ba ◽  
Xin-Chang Li
Keyword(s):  
Ion Implantation ◽  
Dental Implant ◽  
Surface Characteristics ◽  
Low Energy ◽  
Oxygen Ion ◽  
Oxygen Ion Implantation

Water protective surface layer on fluorozirconate glass produced by low‐energy oxygen ion implantation

1991 ◽  
Vol 58 (4) ◽  
pp. 422-424 ◽  
Author(s):  
Yisheng Dai ◽  
Toshiyasu Kawaguchi ◽  
Koichi Suzuki ◽  
Susumu Suzuki ◽  
Kiyoshi Yamamoto ◽  
...  
Keyword(s):  
Surface Layer ◽  
Ion Implantation ◽  
Low Energy ◽  
Oxygen Ion ◽  
Fluorozirconate Glass ◽  
Oxygen Ion Implantation

Formation of ultra-thin silicon-on-insulator materials by low-dose low-energy oxygen ion implantation

2003 ◽  
Vol 367 (1-2) ◽  
pp. 44-48 ◽  
Author(s):  
Xiang Wang ◽  
Jing Chen ◽  
Yemin Dong ◽  
Meng Chen ◽  
Xi Wang
Keyword(s):  
Ion Implantation ◽  
Low Dose ◽  
Low Energy ◽  
Silicon On Insulator ◽  
Oxygen Ion ◽  
Thin Silicon ◽  
Oxygen Ion Implantation
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