Water protective surface layer on fluorozirconate glass produced by low‐energy oxygen ion implantation

Yisheng Dai; Toshiyasu Kawaguchi; Koichi Suzuki; Susumu Suzuki; Kiyoshi Yamamoto; Akio Masui

doi:10.1063/1.104656

Water protective surface layer on fluorozirconate glass produced by low‐energy oxygen ion implantation

Applied Physics Letters ◽

10.1063/1.104656 ◽

1991 ◽

Vol 58 (4) ◽

pp. 422-424 ◽

Cited By ~ 5

Author(s):

Yisheng Dai ◽

Toshiyasu Kawaguchi ◽

Koichi Suzuki ◽

Susumu Suzuki ◽

Kiyoshi Yamamoto ◽

...

Keyword(s):

Surface Layer ◽

Ion Implantation ◽

Low Energy ◽

Oxygen Ion ◽

Fluorozirconate Glass ◽

Oxygen Ion Implantation

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Preparation of multilayered thin silicon‐on‐insulator structure by low‐energy oxygen ion implantation

Applied Physics Letters ◽

10.1063/1.107490 ◽

1992 ◽

Vol 61 (13) ◽

pp. 1543-1545 ◽

Cited By ~ 13

Author(s):

Yukari Ishikawa ◽

Noriyoshi Shibata

Keyword(s):

Ion Implantation ◽

Low Energy ◽

Silicon On Insulator ◽

Oxygen Ion ◽

Thin Silicon ◽

Oxygen Ion Implantation

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Fabrication of highly oriented Si:SiO2 nanoparticles using low energy oxygen ion implantation during Si molecular beam epitaxy

Applied Physics Letters ◽

10.1063/1.115874 ◽

1996 ◽

Vol 68 (16) ◽

pp. 2249-2251 ◽

Cited By ~ 21

Author(s):

Yukari Ishikawa ◽

N. Shibata ◽

S. Fukatsu

Keyword(s):

Molecular Beam Epitaxy ◽

Ion Implantation ◽

Molecular Beam ◽

Low Energy ◽

Oxygen Ion ◽

Oxygen Ion Implantation

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Formation of thin silicon films using low energy oxygen ion implantation

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/0168-583x(91)96229-e ◽

1991 ◽

Vol 55 (1-4) ◽

pp. 555-560 ◽

Cited By ~ 32

Author(s):

A.K. Robinson ◽

C.D. Marsh ◽

U. Bussmann ◽

J.A. Kilner ◽

Y. Li ◽

...

Keyword(s):

Ion Implantation ◽

Low Energy ◽

Silicon Films ◽

Oxygen Ion ◽

Thin Silicon ◽

Oxygen Ion Implantation

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Low Energy Oxygen Ion Implantation and Ion-Bombardment Induced Oxidation of Silicon, Studied by SIMS, AES, and XPS

Springer Series in Chemical Physics - Secondary Ion Mass Spectrometry SIMS IV ◽

10.1007/978-3-642-82256-8_66 ◽

1984 ◽

pp. 244-247 ◽

Cited By ~ 1

Author(s):

P. Sander ◽

U. Kaiser ◽

O. Ganschow ◽

R. Jede ◽

L. Wiedmann ◽

...

Keyword(s):

Ion Implantation ◽

Ion Bombardment ◽

Low Energy ◽

Oxygen Ion ◽

Oxygen Ion Implantation

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Fermi Level Modulation of n-type Doped Single Walled Carbon Nanotube using Buried Local-Gate FET Structure by Oxygen Ion Implantation with Ultra-low Energy Ion Beam of 25eV

10.7567/ssdm.2005.g-7-5 ◽

2005 ◽

Author(s):

Takafumi Kamimura ◽

Kazuhiro Yamamoto ◽

Kazuhiko Matsumoto

Keyword(s):

Carbon Nanotube ◽

Ion Implantation ◽

Fermi Level ◽

Ion Beam ◽

Low Energy ◽

Single Walled Carbon Nanotube ◽

Single Walled Carbon ◽

Oxygen Ion ◽

Oxygen Ion Implantation

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Analysis of thin‐film silicon‐on‐insulator structures formed by low‐energy oxygen ion implantation

Journal of Applied Physics ◽

10.1063/1.349257 ◽

1991 ◽

Vol 70 (7) ◽

pp. 3605-3612 ◽

Cited By ~ 33

Author(s):

Y. Li ◽

J. A. Kilner ◽

A. K. Robinson ◽

P. L. F. Hemment ◽

C. D. Marsh

Keyword(s):

Thin Film ◽

Ion Implantation ◽

Low Energy ◽

Silicon On Insulator ◽

Oxygen Ion ◽

Thin Film Silicon ◽

Oxygen Ion Implantation

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Surface characteristics of a dental implant modified by low energy oxygen ion implantation

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2018.09.003 ◽

2019 ◽

Vol 365 ◽

pp. 208-213 ◽

Cited By ~ 11

Author(s):

Zeng Lin ◽

Shao-Jie Li ◽

Fei Sun ◽

De-Chun Ba ◽

Xin-Chang Li

Keyword(s):

Ion Implantation ◽

Dental Implant ◽

Surface Characteristics ◽

Low Energy ◽

Oxygen Ion ◽

Oxygen Ion Implantation

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Optical waveguide with homogeneous refractive index profile in LiNbO3 by double-low-energy Oxygen ion implantation

Applied Surface Science ◽

10.1016/j.apsusc.2011.06.063 ◽

2011 ◽

Vol 257 (24) ◽

pp. 10342-10345 ◽

Cited By ~ 1

Author(s):

S.-M. Zhang ◽

K.-M. Wang ◽

X.-H. Liu ◽

X.-B. Ming

Keyword(s):

Refractive Index ◽

Ion Implantation ◽

Optical Waveguide ◽

Refractive Index Profile ◽

Low Energy ◽

Index Profile ◽

Oxygen Ion ◽

Oxygen Ion Implantation

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Formation of ultra-thin silicon-on-insulator materials by low-dose low-energy oxygen ion implantation

Chemical Physics Letters ◽

10.1016/s0009-2614(02)01666-4 ◽

2003 ◽

Vol 367 (1-2) ◽

pp. 44-48 ◽

Cited By ~ 6

Author(s):

Xiang Wang ◽

Jing Chen ◽

Yemin Dong ◽

Meng Chen ◽

Xi Wang

Keyword(s):

Ion Implantation ◽

Low Dose ◽

Low Energy ◽

Silicon On Insulator ◽

Oxygen Ion ◽

Thin Silicon ◽

Oxygen Ion Implantation

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Preparation of Thin Silicon-on-Insulator Films by Low-Energy Oxygen Ion Implantation

Japanese Journal of Applied Physics ◽

10.1143/jjap.30.2427 ◽

1991 ◽

Vol 30 (Part 1, No. 10) ◽

pp. 2427-2431 ◽

Cited By ~ 21

Author(s):

Yukari Ishikawa ◽

Noriyoshi Shibata

Keyword(s):

Ion Implantation ◽

Low Energy ◽

Silicon On Insulator ◽

Oxygen Ion ◽

Thin Silicon ◽

Oxygen Ion Implantation

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