Negative ion beam production by a microwave ion source equipped with a magnetically separated double plasma cell system

2000 ◽  
Vol 71 (2) ◽  
pp. 1125-1127 ◽  
Author(s):  
M. Tanaka ◽  
K. Amemiya
Keyword(s):  
Plasma Cell ◽  
Ion Beam ◽  
Cell System ◽  
Ion Source ◽  
Negative Ion ◽  
Beam Production ◽  
Microwave Ion Source

scholarly journals RF and Microwave Ion Sources Study at Institute of Modern Physics

Plasma ◽  
2021 ◽  
Vol 4 (2) ◽  
pp. 332-344
Author(s):  
Qian Y. Jin ◽  
Yu G. Liu ◽  
Yang Zhou ◽  
Qi Wu ◽  
Yao J. Zhai ◽  
...  
Keyword(s):  
Microwave Plasma ◽  
Ion Beam ◽  
Ion Beams ◽  
Ion Source ◽  
Negative Ion ◽  
Power Coupling ◽  
Beam Production ◽  
Planar Coil ◽  
Coil Antenna ◽  
Ridged Waveguide

Intense ion beam production is of high importance for various versatile applications from accelerator injectors to secondary ion mass spectrometry (SIMS). For these purposes, different types of ion beams are needed and, accordingly, the optimum plasma to produce the desired ion beams. RF-type plasma features a simple structure, high plasma density and low plasma temperature, which is essential for negative ion beam production. A very compact RF-type ion source using a planar coil antenna has been developed at IMP for negative molecular oxygen ion beam production. In terms of high-intensity positive ion beam production, 2.45 GHz microwave power-excited plasma has been widely used. At IMP, we developed a 2.45 GHz plasma source with both ridged waveguide and coaxial antenna coupling schemes, tested successfully with intense beam production. Thanks to the plasma built with an external planar coil antenna, high O2− production efficiency has been achieved, i.e., up to 43%. With 2.45 GHz microwave plasma, the ridged waveguide can support a higher power coupling of high efficiency that leads to the production of intense hydrogen beams up to 90 emA, whereas the coaxial antenna is less efficient in power coupling to plasma but can lead to attractive ion source compactness, with a reasonable beam extraction of several emA.

Development of a microwave ion source for negative oxygen ion beam production

1995 ◽  
Vol 66 (10) ◽  
pp. 4911-4915 ◽  
Author(s):  
M. Tanaka ◽  
K. Miyake ◽  
N. Sakudo ◽  
K. Kobayashi ◽  
H. Ohkawa
Keyword(s):  
Ion Beam ◽  
Ion Source ◽  
Oxygen Ion ◽  
Beam Production ◽  
Microwave Ion Source

scholarly journals A Study on the negative ion beam production in the ININ sputtering ion source

2019 ◽  
Vol 65 (3) ◽  
pp. 278
Author(s):  
C. A. Valerio Lizarraga ◽  
C. Duarte-Galvan ◽  
I. Leon-Monzon ◽  
P. Villaseñor ◽  
And J. Aspiazu
Keyword(s):  
Space Charge ◽  
Particle Tracking ◽  
Linear Accelerator ◽  
Ion Beam ◽  
Negative Ions ◽  
Ion Source ◽  
Beam Dynamics ◽  
Negative Ion ◽  
Beam Generation ◽  
Beam Production

To improve the beam brightness produced by a Source of Negative Ions by Cesium Sputtering we studied the beam generation in the 12~MeV Vandergraff linear accelerator at Instituto Nacional de Investigaciones Nucleares. Results of 3D particle tracking simulations of the ion source and beamline have been compared with measurements, with better agreement than traditional codes that only take into account the negative beam, and they determine a suppression in the Cs$^{+}$ production due to space charge, which in turn explains the intensity limits for negative beam production in both ionizers, and the best way to overpass them. Also, the beam dynamics variation due to the erosion of the target inside the cathode has been determined, helping to prevent beam losses and enhance the beam brightness.

High‐energy and high‐current hydrogen negative‐ion beam production with an external‐filter‐type large negative‐ion source

1996 ◽  
Vol 67 (3) ◽  
pp. 1021-1023 ◽  
Author(s):  
Y. Takeiri ◽  
O. Kaneko ◽  
Y. Oka ◽  
K. Tsumori ◽  
E. Asano ◽  
...  
Keyword(s):  
Ion Beam ◽  
High Energy ◽  
Ion Source ◽  
Negative Ion ◽  
High Current ◽  
Beam Production ◽  
Filter Type

New microwave ion source for multiply charged ion beam production

Vacuum ◽  
1988 ◽  
Vol 38 (6) ◽  
pp. 487-490 ◽  
Author(s):  
K Tokiguchi ◽  
K. Amemiya ◽  
H. Koike ◽  
N. Sakudo ◽  
T. Seki
Keyword(s):  
Ion Beam ◽  
Ion Source ◽  
Multiply Charged ◽  
Beam Production ◽  
Microwave Ion Source

Characteristics of extracted ion beam from a cesium-free negative ion source using sheet plasma

2020 ◽  
Vol 91 (11) ◽  
pp. 113302
Author(s):  
H. Kaminaga ◽  
T. Takimoto ◽  
A. Tonegawa ◽  
K. N. Sato
Keyword(s):  
Ion Beam ◽  
Ion Source ◽  
Negative Ion ◽  
Sheet Plasma
Sign in / Sign up

Export Citation Format

Share Document