Development of a microwave ion source for negative oxygen ion beam production

1995 ◽  
Vol 66 (10) ◽  
pp. 4911-4915 ◽  
Author(s):  
M. Tanaka ◽  
K. Miyake ◽  
N. Sakudo ◽  
K. Kobayashi ◽  
H. Ohkawa
Keyword(s):  
Ion Beam ◽  
Ion Source ◽  
Oxygen Ion ◽  
Beam Production ◽  
Microwave Ion Source

New microwave ion source for multiply charged ion beam production

Vacuum ◽  
1988 ◽  
Vol 38 (6) ◽  
pp. 487-490 ◽  
Author(s):  
K Tokiguchi ◽  
K. Amemiya ◽  
H. Koike ◽  
N. Sakudo ◽  
T. Seki
Keyword(s):  
Ion Beam ◽  
Ion Source ◽  
Multiply Charged ◽  
Beam Production ◽  
Microwave Ion Source

Development and test of 2.45 GHz microwave ion source based intense ion beam experimental facility

Vacuum ◽  
2016 ◽  
Vol 124 ◽  
pp. 55-59 ◽  
Author(s):  
Narender Kumar ◽  
G. Rodrigues ◽  
Y. Mathur ◽  
S. Ojha ◽  
R. Ahuja ◽  
...  
Keyword(s):  
Ion Beam ◽  
Ion Source ◽  
Experimental Facility ◽  
Microwave Ion Source

scholarly journals Characteristics of a High Current Microwave Ion Source for Oxygen Ion Implanter.

Shinku ◽  
1999 ◽  
Vol 42 (7) ◽  
pp. 670-675 ◽  
Author(s):  
Takayoshi SEKI ◽  
Katsumi TOKIGUCHI
Keyword(s):  
Ion Source ◽  
High Current ◽  
Oxygen Ion ◽  
Microwave Ion Source

The Synthesis of Metal Oxide Films from Compound Powder Targets

1991 ◽  
Vol 236 ◽  
Author(s):  
A.I. Stognij ◽  
V.V. Tokarev ◽  
Yu.N. Mitin
Keyword(s):  
Metal Oxide ◽  
Ion Beam ◽  
Oxide Films ◽  
Ion Source ◽  
Cold Cathode ◽  
Metal Oxide Films ◽  
Oxygen Ion ◽  
Microscopy Investigation ◽  
Electron Microscopy Investigation ◽  
Cold Cathode Ion Source

AbstractThe paper presents the results of AES, SIMS, RBS and electron microscopy investigation of compound metal oxide films. The films were deposited by sputtering compound targets with oxygen ion beam, extracted from hollow cold cathode ion source.

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