High‐energy and high‐current hydrogen negative‐ion beam production with an external‐filter‐type large negative‐ion source

1996 ◽  
Vol 67 (3) ◽  
pp. 1021-1023 ◽  
Author(s):  
Y. Takeiri ◽  
O. Kaneko ◽  
Y. Oka ◽  
K. Tsumori ◽  
E. Asano ◽  
...  
2016 ◽  
Vol 87 (2) ◽  
pp. 02B127 ◽  
Author(s):  
M. Onai ◽  
H. Etoh ◽  
Y. Aoki ◽  
T. Shibata ◽  
S. Mattei ◽  
...  

Plasma ◽  
2021 ◽  
Vol 4 (2) ◽  
pp. 332-344
Author(s):  
Qian Y. Jin ◽  
Yu G. Liu ◽  
Yang Zhou ◽  
Qi Wu ◽  
Yao J. Zhai ◽  
...  

Intense ion beam production is of high importance for various versatile applications from accelerator injectors to secondary ion mass spectrometry (SIMS). For these purposes, different types of ion beams are needed and, accordingly, the optimum plasma to produce the desired ion beams. RF-type plasma features a simple structure, high plasma density and low plasma temperature, which is essential for negative ion beam production. A very compact RF-type ion source using a planar coil antenna has been developed at IMP for negative molecular oxygen ion beam production. In terms of high-intensity positive ion beam production, 2.45 GHz microwave power-excited plasma has been widely used. At IMP, we developed a 2.45 GHz plasma source with both ridged waveguide and coaxial antenna coupling schemes, tested successfully with intense beam production. Thanks to the plasma built with an external planar coil antenna, high O2− production efficiency has been achieved, i.e., up to 43%. With 2.45 GHz microwave plasma, the ridged waveguide can support a higher power coupling of high efficiency that leads to the production of intense hydrogen beams up to 90 emA, whereas the coaxial antenna is less efficient in power coupling to plasma but can lead to attractive ion source compactness, with a reasonable beam extraction of several emA.


2019 ◽  
Vol 65 (3) ◽  
pp. 278
Author(s):  
C. A. Valerio Lizarraga ◽  
C. Duarte-Galvan ◽  
I. Leon-Monzon ◽  
P. Villaseñor ◽  
And J. Aspiazu

To improve the beam brightness produced by a Source of Negative Ions by Cesium Sputtering we studied the beam generation in the 12~MeV Vandergraff linear accelerator at Instituto Nacional de Investigaciones Nucleares. Results of 3D particle tracking simulations of the ion source and beamline have been compared with measurements, with better agreement than traditional codes that only take into account the negative beam, and they determine a suppression in the Cs$^{+}$ production due to space charge, which in turn explains the intensity limits for negative beam production in both ionizers, and the best way to overpass them. Also, the beam dynamics variation due to the erosion of the target inside the cathode has been determined, helping to prevent beam losses and enhance the beam brightness.


2020 ◽  
Vol 91 (11) ◽  
pp. 113302
Author(s):  
H. Kaminaga ◽  
T. Takimoto ◽  
A. Tonegawa ◽  
K. N. Sato

2017 ◽  
Vol 743 ◽  
pp. 112-117
Author(s):  
Alexander Zolkin ◽  
Anna Semerikova ◽  
Sergey Chepkasov ◽  
Maksim Khomyakov

In the present study, the Raman spectra of diamond-like amorphous (a-C) and hydrogenated amorphous (a-C:H) carbon films on silicon obtained using the ion-beam methods and the pulse cathodic arc deposition technique were investigated with the aim of elucidating the relation between the hardness and structure of the films. The hardness of the samples used in the present study was 19 – 45 GPa. Hydrogenated carbon films were synthesized using END–Hall ion sources and a linear anode layer ion source (LIS) on single-crystal silicon substrates. The gas precursors were CH4 and C3H8, and the rate of the gas flow fed into the ion source was 4.4 to 10 sccm. The ion energies ranged from 150 to 600 eV. a-C films were deposited onto Si substrates using the pulse cathodic arc deposition technique. The films obtained by the pulse arc technique contained elements with an ordered structure. In the films synthesized using low- (150 eV) and high-energy (600 eV) ions beams, an amorphous phase was the major phase. The significant blurriness of the diffraction rings in the electron diffraction patterns due to a large film thickness (180 – 250 nm) did not allow distinctly observing the signals from the elements with an ordered structure against the background of an amorphous phase.


2018 ◽  
Author(s):  
O. Sotnikov ◽  
Yu. Belchenko ◽  
P. Deichuli ◽  
A. Ivanov ◽  
A. Sanin

Sign in / Sign up

Export Citation Format

Share Document