The fabrication of quantum wire structures through application of CCl4 towards lateral growth rate control of GaAs on patterned GaAs substrates

1995 ◽  
Vol 67 (13) ◽  
pp. 1871-1873 ◽  
Author(s):  
Yong Kim ◽  
Yang Keun Park ◽  
Moo‐Sung Kim ◽  
Joon‐Mo Kang ◽  
Seong‐Il Kim ◽  
...  
1997 ◽  
Vol 170 (1-4) ◽  
pp. 665-668 ◽  
Author(s):  
Seong-Il Kim ◽  
Moo-Sung Kim ◽  
Yong Kim ◽  
Seong-Min Hwang ◽  
Byung-Don Min ◽  
...  

Polymer ◽  
2006 ◽  
Vol 47 (21) ◽  
pp. 7601-7606 ◽  
Author(s):  
Koji Yamada ◽  
Kaori Watanabe ◽  
Kiyoka Okada ◽  
Akihiko Toda ◽  
Masamichi Hikosaka

2009 ◽  
Vol 257 (10) ◽  
pp. 2175-2181 ◽  
Author(s):  
Miho Kojima ◽  
Fabio Minoru Yamaji ◽  
Hiroyuki Yamamoto ◽  
Masato Yoshida ◽  
Takahisa Nakai

2007 ◽  
Vol 91 (19) ◽  
pp. 193102 ◽  
Author(s):  
Itaru Gunjishima ◽  
Takashi Inoue ◽  
Atsuto Okamoto

1993 ◽  
Vol 26 (2) ◽  
pp. 185-188
Author(s):  
M. Keulers ◽  
L. Ariaans ◽  
M. Giuseppin ◽  
R. Soeterboek

1995 ◽  
Vol 405 ◽  
Author(s):  
Sung-Bock Kim ◽  
Jeong-Rae Ro ◽  
Seong-Ju Park ◽  
El-Hang Lee

AbstractWe have found that the lateral dimension of InGaAs and GaAs multiple layers can be effectively controlled on non-( 111) V-grooved GaAs substrates by chemical beam epitaxy using triethylgallium and trimethylindium coupled with precracked arsine or unprecracked monoethylarsine. We suggest that this effect is due to the efficient migration of adatoms from (111) to non-(111) planes. This is an improved method which overcomes the difficulty that has been associated with the method of using only (111) V-grooves in which the lateral dimension is controlled by the differences in the growth rates between (111) and (100) planes. In case of InGaAs and GaAs epilayers, the anisotropy factors of growth rate were less than 0.1 at optimum growth temperature. Photoluminescence peak originated from InGaAs/GaAs quantum wire was significantly distinct from other peaks, suggesting an effective reduction of InGaAs lateral dimension.


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