The effects on ion beam optics of a spherical aberration at the plasma boundary

1990 ◽  
Vol 61 (8) ◽  
pp. 2171-2175 ◽  
Author(s):  
E. Surrey ◽  
A. J. T. Holmes
Keyword(s):  
Spherical Aberration ◽  
Ion Beam ◽  
Plasma Boundary ◽  
Beam Optics

scholarly journals A New High-Throughput Focused MeV Ion-Beam Analysis Setup

Instruments ◽  
2021 ◽  
Vol 5 (1) ◽  
pp. 10
Author(s):  
Sören Möller ◽  
Daniel Höschen ◽  
Sina Kurth ◽  
Gerwin Esser ◽  
Albert Hiller ◽  
...  
Keyword(s):  
Gamma Ray ◽  
Rutherford Backscattering Spectrometry ◽  
Ion Beam ◽  
Complete Analysis ◽  
Nuclear Reaction Analysis ◽  
Beam Optics ◽  
Single Measurement ◽  
Ion Beam Analysis ◽  
Beam Analysis ◽  
Technical Solutions

The analysis of material composition by ion-beam analysis (IBA) is becoming a standard method, similar to electron microscopy. A pool of IBA methods exists, from which the combination of particle-induced-X-ray emission (PIXE), particle induced gamma-ray analysis (PIGE), nuclear-reaction-analysis (NRA), and Rutherford-backscattering-spectrometry (RBS) provides the most complete analysis over the whole periodic table in a single measurement. Yet, for a highly resolved and accurate IBA analysis, a sophisticated technical setup is required integrating the detectors, beam optics, and sample arrangement. A new end-station developed and installed in Forschungszentrum Jülich provides these capabilities in combination with high sample throughput and result accuracy. Mechanical tolerances limit the device accuracy to 3% for RBS. Continuous pumping enables 5*10−8 mbar base pressure with vibration amplitudes < 0.1 µm. The beam optics achieves a demagnification of 24–34, suitable for µ-beam analysis. An in-vacuum manipulator enables scanning 50 × 50 mm² sample areas with 10 nm accuracy. The setup features the above-mentioned IBA detectors, enabling a broad range of analysis applications such as the operando analysis of batteries or the post-mortem analysis of plasma-exposed samples with up to 3000 discrete points per day. Custom apertures and energy resolutions down to 11 keV enable separation of Fe and Cr in RBS. This work presents the technical solutions together with the quantification of these challenges and their success in the form of a technical reference.

scholarly journals The Relationships of Microscopic Evolution to Resistivity Variation of a FIB-Deposited Platinum Interconnector

Micromachines ◽  
2020 ◽  
Vol 11 (6) ◽  
pp. 588
Author(s):  
Chaorong Zhong ◽  
Ruijuan Qi ◽  
Yonghui Zheng ◽  
Yan Cheng ◽  
Wenxiong Song ◽  
...  
Keyword(s):  
Electron Beam ◽  
Focused Ion Beam ◽  
Spherical Aberration ◽  
Ion Beam ◽  
Electrical Contact ◽  
Heating Process ◽  
Comprehensive Understanding ◽  
Irreversible Damage ◽  
Resistivity Variation

Depositing platinum (Pt) interconnectors during the sample preparation process via a focused ion beam (FIB) system is an inescapable procedure for in situ transmission electron microscopy (TEM) investigations. To achieve good electrical contact and avoid irreversible damage in practical samples, the microscopic evolution mechanism of FIB-deposited Pt interconnectors need a more comprehensive understanding, though it is known that its resistivity could be affected by thermal annealing. In this work, an electron-beam FIB-deposited Pt interconnector was studied by advanced spherical aberration (Cs)-corrected TEM combined with an in situ heating and biasing system to clarify the relationship of microscopic evolution to resistivity variation. During the heating process, the Pt interconnector underwent crystallization, organic matter decomposition, Pt nanocrystal growth, grain connection, and conductive path formation, which are combined actions to cause several orders of magnitude of resistivity reduction. The comprehensive understanding of the microscopic evolution of FIB-deposited Pt material is beneficial, not only for optimizing the resistance performance of Pt as an interconnector, but also for understanding the role of C impurities with metal materials. For the purpose of wiring, annealed electron-beam (EB)-deposited Pt material can be recommended for use as an interconnector in devices for research purposes.

scholarly journals 14C AMS Measurements of <100 μG Samples with a High-Current System

Radiocarbon ◽  
1997 ◽  
Vol 40 (1) ◽  
pp. 247-253 ◽  
Author(s):  
Karl F. Von Reden ◽  
Ann P. McNichol ◽  
Ann Pearson ◽  
Robert J. Schneider
Keyword(s):  
Current System ◽  
Ion Beam ◽  
Beam Current ◽  
Small Sample ◽  
Small Samples ◽  
High Current ◽  
Beam Optics ◽  
Woods Hole Oceanographic Institution ◽  
Factors Affecting ◽  
The Past

The NOSAMS facility at Woods Hole Oceanographic Institution has started to develop and apply techniques for measuring very small samples on a standard Tandetron accelerator mass spectrometry (AMS) system with high-current hemispherical Cs sputter ion sources. Over the past year, results on samples ranging from 7 to 160 μg C showed both the feasibility of such analyses and the present limitations on reducing the size of solid carbon samples. One of the main factors affecting the AMS results is the dependence of a number of the beam optics parameters on the extracted ion beam current. The extracted currents range from 0.5 to 10 μA of 12C− for the sample sizes given above. We here discuss the setup of the AMS system and methods for reliable small-sample measurements and give the AMS-related limits to sample size and the measurement uncertainties.

The use of micro-computers in the simulation of ion beam optics

Vacuum ◽  
1989 ◽  
Vol 39 (11-12) ◽  
pp. 1043-1046 ◽  
Author(s):  
Peter Spädtke ◽  
Detlef Ivens
Keyword(s):  
Ion Beam ◽  
Beam Optics

Deceleration and ion beam optics in the regime of 10–200 eV

1991 ◽  
Vol 9 (2) ◽  
pp. 312-316 ◽  
Author(s):  
K. K. Foo ◽  
R. P. W. Lawson ◽  
X. Feng ◽  
W. M. Lau
Keyword(s):  
Ion Beam ◽  
Beam Optics

A study of two‐stage ion‐beam optics

1978 ◽  
Vol 49 (2) ◽  
pp. 517-524 ◽  
Author(s):  
Jinchoon Kim ◽  
J. H. Whealton ◽  
Gerd Schilling
Keyword(s):  
Ion Beam ◽  
Beam Optics ◽  
Two Stage

Improvement of ion beam brightness by reducing voltage ripple of an electrostatic accelerator for microbeam focusing by a triplet quadrupole lens system having large spherical aberration coefficient

2013 ◽  
Vol 23 (03n04) ◽  
pp. 171-181 ◽  
Author(s):  
S. Matsuyama ◽  
K. Watanabe ◽  
K. Ishii ◽  
A. Terakawa ◽  
M. Fujisawa ◽  
...  
Keyword(s):  
Energy Resolution ◽  
Spherical Aberration ◽  
Ion Beam ◽  
Spot Size ◽  
Beam Current ◽  
Lens System ◽  
Beam Spot ◽  
Beam Spot Size ◽  
Voltage Ripple ◽  
Terminal Voltage

The microbeam system at Tohoku University was upgraded to a triplet lens system aiming at applying to the analysis of sub-micron features. The triplet lens system has a higher demagnification than the existing doublet system. However, the introduction of the triplet system also resulted in larger chromatic and spherical aberration coefficients. To overcome these problems, the energy resolution of the accelerator was improved by developing a terminal voltage stabilization system. The energy resolution of the accelerator was improved to 1 × 10−5 ΔE/E, which resulted in an increase in the brightness of the beam. The beam brightness was 2.3 pA Δ μm−2 Δ mrad−2 Δ MeV− and was higher in the central region. The effects of the increased chromatic and spherical aberration were mitigated by restricting the divergence angle without reducing the beam current. A beam spot size of 0.6 × 0.8 μm2 was obtained with a beam current of 150 pA.

Sign in / Sign up

Export Citation Format

Share Document