High‐current surface‐plasma negative‐ion sources with geometrical focusing

1990 ◽  
Vol 61 (1) ◽  
pp. 484-486 ◽  
Author(s):  
Yu. I. Belchenko ◽  
A. S. Kupriyanov
Keyword(s):  
Ion Sources ◽  
Negative Ion ◽  
High Current ◽  
Surface Plasma

Studies of surface-plasma negative ion sources at Novosibirsk

1988 ◽  
Vol 28 (4) ◽  
pp. 568-576 ◽  
Author(s):  
Yu. I. Belchenko ◽  
G. E. Derevyankin ◽  
G. I. Dimov ◽  
V. G. Dudnikov
Keyword(s):  
Ion Sources ◽  
Negative Ion ◽  
Surface Plasma

Cesium control and diagnostics in surface plasma negative ion sources

2010 ◽  
Vol 81 (2) ◽  
pp. 02A714 ◽  
Author(s):  
Vadim Dudnikov ◽  
Pavel Chapovsky ◽  
Andrei Dudnikov
Keyword(s):  
Ion Sources ◽  
Negative Ion ◽  
Surface Plasma

High Current Implantation of Negative Copper Ions into Silica Glasses

1996 ◽  
Vol 438 ◽  
Author(s):  
N. Kishimoto ◽  
V. T. Gritsyna ◽  
K. Kono ◽  
H. Amekura ◽  
T. Saito
Keyword(s):  
Copper Ions ◽  
Ion Beams ◽  
Negative Ion ◽  
Fixed Dose ◽  
High Dose ◽  
High Current ◽  
Surface Plasma ◽  
Silica Glasses ◽  
Dose Rates ◽  
Optical Absorption And Reflection

AbstractHigh- current implantation of Cu- ions into silica glasses has been demonstrated using mAclass negative ion beams at 60 keV. Negative ion implantation has an advantage to alleviate specimen charging for insulating substrates and has attained high dose rates, up to 260 μA/cm2. Spherical Cu colloids form in the silica glasses without additional thermal annealing. Optical absorption and reflection of the implanted specimens vary with the current density, even at a fixed dose level. A beam- induced surface plasma may affect the high current implantation.

High current negative ion sources (invited)

1990 ◽  
Vol 61 (1) ◽  
pp. 662-664 ◽  
Author(s):  
K. W. Ehlers
Keyword(s):  
Ion Sources ◽  
Negative Ion ◽  
High Current
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