Dual‐laser ablation for particulate‐free film growth

1995 ◽  
Vol 66 (12) ◽  
pp. 1469-1471 ◽  
Author(s):  
S. Witanachchi ◽  
K. Ahmed ◽  
P. Sakthivel ◽  
P. Mukherjee
Keyword(s):  
Laser Ablation ◽  
Film Growth ◽  
Free Film ◽  
Dual Laser

Evidence for the physical basis and universality of the elimination of particulates using dual-laser ablation. I. Dynamic time-resolved target melt studies, and film growth of Y2O3 and ZnO

2002 ◽  
Vol 91 (4) ◽  
pp. 1828-1836 ◽  
Author(s):  
Pritish Mukherjee ◽  
Shudong Chen ◽  
John B. Cuff ◽  
Palanikumaran Sakthivel ◽  
Sarath Witanachchi
Keyword(s):  
Laser Ablation ◽  
Film Growth ◽  
Physical Basis ◽  
Time Resolved ◽  
Dynamic Time ◽  
Dual Laser

scholarly journals Highly Ionized Carbon Plasma Generation by Dual-Laser Ablation for Diamond-Like Carbon Film Growth

2000 ◽  
Vol 617 ◽  
Author(s):  
S. Witanachchi ◽  
A. M. Miyawa ◽  
P. Mukherjee
Keyword(s):  
Laser Ablation ◽  
Film Growth ◽  
Carbon Film ◽  
Plasma Temperature ◽  
Optical Emission ◽  
Carbon Films ◽  
Rapid Expansion ◽  
Laser Ablation Process ◽  
Carbon Plasma ◽  
Dual Laser

AbstractCarbon plasmas produced by excimer laser ablation show a low ionization yield of about 8-10%. The coupling of a second CO2laser pulse into the plasma in the dual-laser ablation process significantly increases the plasma temperature and the ionization. The resulting rapid expansion of the plasma gives rise to high ion kinetic energies and broader ion expansion profiles [1]. Optical emission spectroscopy and an ion probe have been used to investigate the dynamics of the carbon plasma. Single and dual-laser ablated carbon plumes have been deposited on DC-biased silicon substrates to form amorphous carbon films. The diamond-like behavior of these films was studied by Raman spectroscopy. The Raman spectra were deconvolved to gauge the effect of the density and the energy of ions on the formation of diamond-like sp3 -bonded carbon (DLC) films. The advantage offered by the dual-laser process for the growth of DLC films is discussed.

Effect of Non-equilibrium Pulsed Ejection of Si Species into Background Gas on the Formation of Si Nanocrystallite and Nanocrystal-film

2011 ◽  
Vol 1305 ◽  
Author(s):  
Ikurou Umezu ◽  
Shunto Okubo ◽  
Akira Sugimura
Keyword(s):  
Laser Ablation ◽  
Film Growth ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Hydrogen Gas ◽  
Gas Pressure ◽  
Spatial Confinement ◽  
The Individual ◽  
Background Gas ◽  
Non Equilibrium

ABSTRACTThe Si nanocrystal-films are prepared by pulsed laser ablation of Si target in a mixture of helium and hydrogen gas. The total gas pressure and hydrogen partial gas pressure were varied to control structure of nanocrystal-film. The surface of Si nanocrystallite was hydrogenated and degree of hydrogenation increased with increasing hydrogen partial gas pressure. The aggregate structure of nanocrystal-film depended on both the total gas pressure and the hydrogen partial gas pressure. The former and the latter alter spatial confinement of Si species during deposition and the surface hydrogenation of individual nanocrystal, respectively. Spatial confinement increases probability of collision between nanocrystals in the plume. While, surface hydrogenation prevents coalescence of nanocrystals. The individual or aggregated nanocrystals formed in the plume reach the substrate and the nanocrystal-film is deposited on the substrate. The non-equilibrium growth processes during pulsed laser ablation are essential for the formation of the surface structure and the subsequent nanocrystal-film growth. Our results indicate that the structure of nanocrystal-film depends on the probabilities of collision and coalescence between nanocrystals in the plume. These probabilities can be varied by controlling the total gas pressure and the hydrogen partial gas pressure.

Rapid cell mode switching and dual laser ablation inductively coupled plasma mass spectrometry for elemental bioimaging

2014 ◽  
Vol 28 (23) ◽  
pp. 2627-2635 ◽  
Author(s):  
Christoph A. Wehe ◽  
Ann-Christin Niehoff ◽  
Georgina M. Thyssen ◽  
Michael Sperling ◽  
Uwe Karst
Keyword(s):  
Mass Spectrometry ◽  
Laser Ablation ◽  
Inductively Coupled Plasma ◽  
Mode Switching ◽  
Inductively Coupled ◽  
Plasma Mass Spectrometry ◽  
Dual Laser
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