High‐temperature operation of strained Si0.65Ge0.35/Si(111)p‐type multiple‐quantum‐well light‐emitting diode grown by solid source Si molecular‐beam epitaxy
2012 ◽
Vol 24
(11)
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pp. 909-911
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Keyword(s):
Keyword(s):
2000 ◽
Vol 18
(3)
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pp. 1720
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2002 ◽
Vol 41
(Part 1, No. 7A)
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pp. 4515-4516
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Keyword(s):
Keyword(s):
1995 ◽
Vol 150
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pp. 1323-1327
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2017 ◽
Vol 17
(3)
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pp. 398-402
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