Low temperature silicon epitaxy in an ultrahigh vacuum rapid thermal chemical vapor deposition reactor using disilane

1993 ◽  
Vol 63 (9) ◽  
pp. 1225-1227 ◽  
Author(s):  
Mahesh K. Sanganeria ◽  
Katherine E. Violette ◽  
Mehmet C. Öztürk
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Ultrahigh Vacuum ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Reactor ◽  
Thermal Chemical Vapor Deposition ◽  
Silicon Epitaxy

Low temperature selective silicon epitaxy by ultra high vacuum rapid thermal chemical vapor deposition using Si2H6, H2 and Cl2

1996 ◽  
Vol 68 (1) ◽  
pp. 66-68 ◽  
Author(s):  
Katherine E. Violette ◽  
Patricia A. O’Neil ◽  
Mehmet C. Öztürk ◽  
Kim Christensen ◽  
Dennis M. Maher
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
High Vacuum ◽  
Chemical Vapor ◽  
Ultra High Vacuum ◽  
Thermal Chemical Vapor Deposition ◽  
Silicon Epitaxy
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