Effect of Al doping on low‐temperature epitaxy of 3C‐SiC/Si by chemical vapor deposition using hexamethyldisilane as a source material

1992 ◽  
Vol 61 (17) ◽  
pp. 2081-2083 ◽  
Author(s):  
Koji Takahashi ◽  
Shigehiro Nishino ◽  
Junji Saraie
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Source Material ◽  
Al Doping ◽  
Low Temperature Epitaxy

Atomic Layer Chemical Vapor Deposition of TiO[sub 2] Low Temperature Epitaxy of Rutile and Anatase

2000 ◽  
Vol 147 (9) ◽  
pp. 3319 ◽  
Author(s):  
Mikael Schuisky ◽  
Anders Hårsta ◽  
Aleks Aidla ◽  
Kaupo Kukli ◽  
Alma-Asta Kiisler ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Atomic Layer ◽  
Low Temperature Epitaxy

scholarly journals Practical Route for the Low-Temperature Growth of Large-Area Bilayer Graphene on Polycrystalline Nickel by Cold-Wall Chemical Vapor Deposition

ACS Omega ◽  
2021 ◽  
Author(s):  
Muhammad Aniq Shazni Mohammad Haniff ◽  
Nur Hamizah Zainal Ariffin ◽  
Poh Choon Ooi ◽  
Mohd Farhanulhakim Mohd Razip Wee ◽  
Mohd Ambri Mohamed ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Bilayer Graphene ◽  
Cold Wall ◽  
Polycrystalline Nickel ◽  
Large Area ◽  
Temperature Growth ◽  
Low Temperature Growth
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