Application of electron cyclotron resonance plasma source to conductive film deposition

1995 ◽  
Vol 13 (3) ◽  
pp. 815-819 ◽  
Author(s):  
Masaru Shimada ◽  
Toshiro Ono ◽  
Hiroshi Nishimura ◽  
Seitaro Matsuo
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