Electron cyclotron resonance plasma deposition of silicon nitride: Effect of very low rf substrate bias

K. A. Buckle; J. Rodgers; K. Pastor; C. Constantine; D. Johnson

doi:10.1063/1.106921

Electron cyclotron resonance plasma deposition of silicon nitride: Effect of very low rf substrate bias

Applied Physics Letters ◽

10.1063/1.106921 ◽

1992 ◽

Vol 60 (21) ◽

pp. 2601-2603 ◽

Cited By ~ 11

Author(s):

K. A. Buckle ◽

J. Rodgers ◽

K. Pastor ◽

C. Constantine ◽

D. Johnson

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Substrate Bias ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Electron cyclotron resonance plasma deposition and etching of silicon nitride on GaSb for optoelectronic applications

Materials Science and Engineering B ◽

10.1016/0921-5107(94)90085-x ◽

1994 ◽

Vol 28 (1-3) ◽

pp. 369-373

Author(s):

R. Bonnot ◽

A. Gouskov ◽

G. Bougnot

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Optoelectronic Applications ◽

Resonance Plasma

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Electron-Cyclotron-Resonance Plasma Deposition of Carbon onto Silicon

Springer Proceedings in Physics - Amorphous and Crystalline Silicon Carbide II ◽

10.1007/978-3-642-75048-9_12 ◽

1989 ◽

pp. 60-65

Author(s):

J. Pankove ◽

V. Hornback ◽

S. Sritharan ◽

J. Wilson ◽

S. Asher ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Silicon nitride deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposititon for micromachining applications

10.1117/12.324050 ◽

1998 ◽

Author(s):

Roberto R. Panepucci ◽

Jose A. Diniz ◽

Eduardo Carli ◽

Peter J. Tatschi ◽

Jacobus W. Swart

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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SiO2 planarization technology with biasing and electron cyclotron resonance plasma deposition for submicron interconnections

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.583518 ◽

1986 ◽

Vol 4 (4) ◽

pp. 818 ◽

Cited By ~ 44

Author(s):

Katsuyuki Machida

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Pulse‐time‐modulated electron cyclotron resonance plasma etching with low radio‐frequency substrate bias

Applied Physics Letters ◽

10.1063/1.116071 ◽

1996 ◽

Vol 68 (3) ◽

pp. 316-318 ◽

Cited By ~ 41

Author(s):

Seiji Samukawa

Keyword(s):

Radio Frequency ◽

Plasma Etching ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Substrate Bias ◽

Pulse Time ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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An electron cyclotron resonance plasma deposition technique employing magnetron mode sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.575588 ◽

1988 ◽

Vol 6 (4) ◽

pp. 2348-2352 ◽

Cited By ~ 38

Author(s):

Chiharu Takahashi ◽

Mikiho Kiuchi ◽

Toshiro Ono ◽

Seitaro Matsuo

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Deposition Technique ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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I‐Vcharacteristics of electron‐cyclotron‐resonance plasma‐enhanced chemical‐vapor‐deposition silicon nitride thin films

Journal of Applied Physics ◽

10.1063/1.356455 ◽

1994 ◽

Vol 75 (2) ◽

pp. 979-984 ◽

Cited By ~ 26

Author(s):

Yoo‐Chan Jeon ◽

Ho‐Young Lee ◽

Seung‐Ki Joo

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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On the silicon nitride film formation from N/sub 2/-SiH/sub 4/ electron cyclotron resonance plasma

IEEE Conference Record - Abstracts. 1992 IEEE International Conference on Plasma ◽

10.1109/plasma.1992.697984 ◽

2005 ◽

Author(s):

Sun-Kyu Song ◽

Hong-young Chang

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Film Formation ◽

Electron Cyclotron ◽

Nitride Film ◽

Silicon Nitride Film ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Comment on “Search for carbon nitride CNx compounds with a high nitrogen content by electron cyclotron resonance plasma deposition”, Diamond relat. mater., 3 (1994) 264–269

Diamond and Related Materials ◽

10.1016/0925-9635(94)90134-1 ◽

1994 ◽

Vol 3 (10) ◽

pp. 1277-1278 ◽

Cited By ~ 2

Author(s):

K.J. Boyd ◽

D. Marton ◽

S.S. Todorov ◽

A.H. Al-Bayati ◽

J.W. Rabalais

Keyword(s):

Nitrogen Content ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

High Nitrogen Content ◽

High Nitrogen ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Electron Cyclotron Resonance Plasma Deposition Technique Using Raw Material Supply by Sputtering

Japanese Journal of Applied Physics ◽

10.1143/jjap.23.l534 ◽

1984 ◽

Vol 23 (Part 2, No. 8) ◽

pp. L534-L536 ◽

Cited By ~ 95

Author(s):

Toshiro Ono ◽

Chiharu Takahashi ◽

Seitaro Matsuo

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Raw Material ◽

Deposition Technique ◽

Electron Cyclotron Resonance Plasma ◽

Material Supply ◽

Resonance Plasma

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