Characterization of Si/SiGe strained‐layer superlattices grown by ultrahigh vacuum/chemical vapor deposition technique

P. J. Wang; M. S. Goorsky; B. S. Meyerson; F. K. LeGoues; M. J. Tejwani

doi:10.1063/1.105352

Characterization of Si/SiGe strained‐layer superlattices grown by ultrahigh vacuum/chemical vapor deposition technique

Applied Physics Letters ◽

10.1063/1.105352 ◽

1991 ◽

Vol 59 (7) ◽

pp. 814-816 ◽

Cited By ~ 26

Author(s):

P. J. Wang ◽

M. S. Goorsky ◽

B. S. Meyerson ◽

F. K. LeGoues ◽

M. J. Tejwani

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Ultrahigh Vacuum ◽

Chemical Vapor ◽

Deposition Technique ◽

Strained Layer ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Strained Layer Superlattices

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Characterization of Si/SiGe Strained-Layer Superlattices Grown by an Ultrahigh Vacuum/Chemical Vapor Deposition Technique

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.1787 ◽

1994 ◽

Vol 33 (Part 1, No. 4A) ◽

pp. 1787-1792 ◽

Cited By ~ 4

Author(s):

Ting-Chang Chang ◽

Chun-Yen Chang ◽

Tz-Guei Jung ◽

Wen-Chung Tsai ◽

Guo-Wei Huang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Ultrahigh Vacuum ◽

Chemical Vapor ◽

Deposition Technique ◽

Strained Layer ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Strained Layer Superlattices

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Nanometer thick Si/SiGe strained‐layer superlattices grown by an ultrahigh vacuum/chemical vapor deposition technique

Journal of Applied Physics ◽

10.1063/1.356104 ◽

1994 ◽

Vol 75 (7) ◽

pp. 3441-3445 ◽

Cited By ~ 5

Author(s):

T. C. Chang ◽

C. Y. Chang ◽

T. G. Jung ◽

W. C. Tsai ◽

P. J. Wang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Ultrahigh Vacuum ◽

Chemical Vapor ◽

Deposition Technique ◽

Strained Layer ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Strained Layer Superlattices

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Growth and characterization of ZnO and MgxZn1−xO thin films by aerosol assisted chemical vapor deposition technique

Thin Solid Films ◽

10.1016/j.tsf.2011.12.075 ◽

2012 ◽

Vol 520 (9) ◽

pp. 3505-3509 ◽

Cited By ~ 8

Author(s):

Vipin K. Kaushik ◽

Tapas Ganguli ◽

Ravi Kumar ◽

C. Mukherjee ◽

P.K. Sen

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Preparation and characterization of silica overlayers deposited on magnesia surface by chemical vapor deposition technique.

Hyomen Kagaku ◽

10.1380/jsssj.11.489 ◽

1990 ◽

Vol 11 (8) ◽

pp. 489-494

Author(s):

Yasutake TERAOKA ◽

Yuji YOSEMOTO ◽

Hirofumi KAJIWARA ◽

Shuichi KAGAWA

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Quantum confinement effects of Si/SiGe strained-layer superlattices grown by an ultrahigh vacuum/chemical vapor deposition technique

Journal of Materials Science Materials in Electronics ◽

10.1007/bf00215576 ◽

1994 ◽

Vol 5 (6) ◽

pp. 370-374 ◽

Cited By ~ 1

Author(s):

T.C. Chang ◽

C.Y. Chang ◽

T.G. Jung ◽

P.A. Chen ◽

W.C. Tsai ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Quantum Confinement ◽

Ultrahigh Vacuum ◽

Chemical Vapor ◽

Deposition Technique ◽

Confinement Effects ◽

Quantum Confinement Effects ◽

Vapor Deposition Technique ◽

Strained Layer Superlattices

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Growth and Characterization of Boron-Carbon Structures with the Hot Filament Chemical Vapor Deposition Technique

Silicon ◽

10.1007/s12633-017-9662-6 ◽

2018 ◽

Vol 10 (4) ◽

pp. 1731-1736 ◽

Cited By ~ 1

Author(s):

B. Mahdavipour ◽

A. Salar Elahi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Carbon Structures ◽

Vapor Deposition Technique ◽

Hot Filament ◽

Boron Carbon

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Growth and characterization of boron doped graphene by Hot Filament Chemical Vapor Deposition Technique (HFCVD)

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2015.12.038 ◽

2016 ◽

Vol 438 ◽

pp. 70-75 ◽

Cited By ~ 16

Author(s):

A. Jafari ◽

M. Ghoranneviss ◽

A. Salar Elahi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Boron Doped ◽

Vapor Deposition Technique ◽

Doped Graphene ◽

Hot Filament

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RETRACTED: Synthesis of carbon nanotubes using the cobalt nanocatalyst by thermal chemical vapor deposition technique

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2015.07.063 ◽

2015 ◽

Vol 648 ◽

pp. 1104-1108 ◽

Cited By ~ 14

Author(s):

S.S. Madani ◽

K. Zare ◽

M. Ghoranneviss ◽

A. Salar Elahi

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Thermal Chemical Vapor Deposition ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Synthesis Of Carbon Nanotubes

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Investigation of polycrystalline silicon grain structure with single wafer chemical vapor deposition technique

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1355364 ◽

2001 ◽

Vol 19 (4) ◽

pp. 1898-1901 ◽

Cited By ~ 3

Author(s):

H. Bu ◽

C. Hu ◽

M. Bevan ◽

S. Wang ◽

E. Sanchez ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Grain Structure ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Fabrication of aluminum oxide thin films by a low‐pressure metalorganic chemical vapor deposition technique

Applied Physics Letters ◽

10.1063/1.108838 ◽

1993 ◽

Vol 62 (7) ◽

pp. 681-683 ◽

Cited By ~ 34

Author(s):

J. S. Kim ◽

H. A. Marzouk ◽

P. J. Reucroft ◽

J. D. Robertson ◽

C. E. Hamrin

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Metalorganic Chemical

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