Extremely low threshold current AlGaAs buried‐heterostructure quantum well lasers grown by liquid phase epitaxy

1990 ◽  
Vol 57 (27) ◽  
pp. 2873-2875 ◽  
Author(s):  
Zh. I. Alferov ◽  
V. M. Andreyev ◽  
A. Z. Mereutza ◽  
A. V. Syrbu ◽  
V. P. Yakovlev
1988 ◽  
Vol 53 (16) ◽  
pp. 1459-1461 ◽  
Author(s):  
J. E. Epler ◽  
R. L. Thornton ◽  
W. J. Mosby ◽  
T. L. Paoli

1998 ◽  
Vol 83 (1) ◽  
pp. 8-14 ◽  
Author(s):  
G. W. Yang ◽  
J. Y. Xu ◽  
Z. T. Xu ◽  
J. M. Zhang ◽  
L. H. Chen ◽  
...  

1996 ◽  
Vol 07 (03) ◽  
pp. 373-381
Author(s):  
LIANGHUI CHEN

Quantum well lasers have attracted a great deal of attention by their many advantages such as low threshold current density, excellent temperature feature, high modulation rate and wavelength adjustability etc. The investigation on quantum well laser in mainland China started in the early 80s. AlGaAs/GaAs QW laser diode and InGaAs/GaAs strained layer QW laser diode have been developed using MBE technology with extremely low threshold current and high T0. Now the growth technologies for QW structure have been expanded to MOCVD technology. Emission wavelengths, on longer wavelength sides have been expanded up to 1.3 µm and 1.55 µm with InGaAsP/InP material system for application in optical fiber communication. On shorter wavelength sides, the emission wavelength has been expanded to lower than 670 nm, for applications in optical information processing. The characteristics of these devices will be demonstrated in this paper. The QW-DFB LD and low-dimension quantum wire and quantum dot lasers are under investigation.


1992 ◽  
Vol 4 (11) ◽  
pp. 1189-1191 ◽  
Author(s):  
P.L. Derry ◽  
H.E. Hager ◽  
K.C. Chiu ◽  
D.J. Booher ◽  
E.C. Miao ◽  
...  

1991 ◽  
Author(s):  
V. M. Andreev ◽  
A. B. Kazantsev ◽  
V. R. Larlonov ◽  
V. D. Rumyantsev ◽  
V. P. Khvostikov

1988 ◽  
Vol 52 (17) ◽  
pp. 1371-1373 ◽  
Author(s):  
J. E. Epler ◽  
R. L. Thornton ◽  
T. L. Paoli

Sign in / Sign up

Export Citation Format

Share Document