Atomic layer growth of silicon by excimer laser induced cryogenic chemical vapor deposition

1990 ◽  
Vol 56 (15) ◽  
pp. 1445-1447 ◽  
Author(s):  
T. Tanaka ◽  
T. Fukuda ◽  
Y. Nagasawa ◽  
S. Miyazaki ◽  
M. Hirose
Keyword(s):  
Chemical Vapor Deposition ◽  
Excimer Laser ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Atomic Layer ◽  
Layer Growth

Atomic Layer Chemical Vapor Deposition

2012 ◽  
pp. 160-160
Author(s):  
Antonio Aliano ◽  
Giancarlo Cicero ◽  
Hossein Nili ◽  
Nicolas G. Green ◽  
Pablo García-Sánchez ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Atomic Layer
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