Heteroepitaxial growth of Ga0.51In0.49P/GaAs on Si by low‐pressure organometallic chemical vapor deposition

1988 ◽  
Vol 53 (26) ◽  
pp. 2614-2616 ◽  
Author(s):  
R. H. Horng ◽  
D. S. Wuu ◽  
M. K. Lee
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Heteroepitaxial Growth ◽  
Gaas On Si ◽  
Organometallic Chemical Vapor Deposition

High‐Tc Undoped and Pb‐Doped BI‐SR‐CA‐CU‐O thin Films Prepared by Organometallic Chemical Vapor Deposition

1989 ◽  
Vol 169 ◽  
Author(s):  
J. M. Zhang ◽  
H. O Marcy ◽  
L .M. Tonge ◽  
B. W. Wessels ◽  
T. J. Marks ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
High Tc ◽  
Metal Organic ◽  
Organic Precursors ◽  
Organometallic Chemical Vapor Deposition

AbstractFilms of the high‐Tc undoped and Pb‐doped Bi‐Sr‐Ca‐Cu‐O (BSCCO) superconductors have been prepared by low pressure organometallic chemical vapor deposition (OMCVD) using the volatile metal‐organic precursors Cu(acetylacetonate)2, Sr(dipivaloylmethanate)2, Ca(dipivaloylmethanate)2, and triphenyl bismuth. Factors which influence texture and morphology of the OMCVD‐derived films have been investigated, including the effects of annealing, doping, and substrates.

Preparation of ZnO Films by Low-pressure Organometallic Chemical Vapor Deposition

1993 ◽  
Vol 22 (12) ◽  
pp. 2133-2136 ◽  
Author(s):  
Kenkichiro Kobayashi ◽  
Toshihiro Matsubara ◽  
Shigenori Matsushima ◽  
Gengi Okada
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Zno Films ◽  
Organometallic Chemical Vapor Deposition
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