Ordered mesoporous silica and alumina thin films studied by X-ray scattering

2002 ◽  
Vol 12 (6) ◽  
pp. 283-290 ◽  
Author(s):  
M. Klotz ◽  
N. Idrissi-Kandri ◽  
A. Ayral ◽  
A. van der Lee ◽  
C. Guizard
2009 ◽  
Vol 113 (34) ◽  
pp. 15201-15210 ◽  
Author(s):  
Susanne Jähnert ◽  
Dirk Müter ◽  
Johannes Prass ◽  
Gerald A. Zickler ◽  
Oskar Paris ◽  
...  

2016 ◽  
Vol 22 (1) ◽  
pp. 197-201
Author(s):  
Sayyed Naweed Emamy ◽  
Debasis Gupta ◽  
AnoopK. Mukhopadhyay ◽  
Jiten Ghosh

2005 ◽  
Vol 86 (11) ◽  
pp. 113108 ◽  
Author(s):  
Sandrine Dourdain ◽  
Jean-François Bardeau ◽  
Maggy Colas ◽  
Bernd Smarsly ◽  
Ahmad Mehdi ◽  
...  

1999 ◽  
Vol 14 (7) ◽  
pp. 2905-2911 ◽  
Author(s):  
Sangsub Kim ◽  
Tae Soo Kang ◽  
Jung Ho Je

Epitaxial (Ba0.5Sr0.5) TiO3 thin films of two different thickness (∼25 and ∼134 nm) on MgO(001) prepared by a pulsed laser deposition method were studied by synchrotron x-ray scattering measurements. The film grew initially with a cube-on-cube relationship, maintaining it during further growth. As the film grew, the surface of the film became significantly rougher, but the interface between the film and the substrate did not. In the early stage of growth, the film was highly strained in a tetragonal structure (c/a = 1.04) with the longer axis parallel to the surface normal direction. As the growth proceeded further, it relaxed to a cubic structure with the lattice parameter near the bulk value, and the mosaic distribution improved significantly in both in- and out-of-plane directions. The thinner film (∼25 nm) showed only one domain limited mainly by the film thickness, but the thicker film (∼134 nm) exhibited three domains along the surface normal direction.


2001 ◽  
Vol 714 ◽  
Author(s):  
Kazuhiko Omote ◽  
Shigeru Kawamura

ABSTRACTWe have successively developed a new x-ray scattering technique for a non-destructive determination of pore-size distributions in porous low-κ thin films formed on thick substrates. The pore size distribution in a film is derived from x-ray diffuse scattering data, which are measured using offset θ/2θ scans to avoid strong specular reflections from the film surface and its substrate. Γ-distribution mode for the pores in the film is used in the calculation. The average diameter and the dispersion parameter of the Γ-distribution function are varied and refined by computer so that the calculated scattering pattern best matches to the experimental pattern. The technique has been used to analyze porous methyl silsesquioxane (MSQ) films. The pore size distributions determined by the x-ray scattering technique agree with that of the commonly used gas adsorption technique. The x-ray technique has been also used successfully determine small pores less than one nanometer in diameter, which is well below the lowest limit of the gas adsorption technique.


2009 ◽  
Vol 113 (38) ◽  
pp. 12623-12627 ◽  
Author(s):  
Hong-Ji Chen ◽  
Sheng-Ying Li ◽  
Xiao-Jun Liu ◽  
Rui-Peng Li ◽  
Detlef-M. Smilgies ◽  
...  

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