GROWTH MECHANISM OF EPITAXIAL SILICON CARBIDE PRODUCED USING RAPID THERMAL CVD
1991 ◽
Vol 02
(C2)
◽
pp. C2-823-C2-830
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2016 ◽
Vol 214
(4)
◽
pp. 1600437
◽
2003 ◽
Vol 47
(2-3)
◽
pp. 139-165
◽
2002 ◽
Vol 236
(1-3)
◽
pp. 101-112
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Keyword(s):
2009 ◽
Vol 15
(1-3)
◽
pp. 39-46
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1962 ◽
Vol 7
(83)
◽
pp. 1847-1860
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2000 ◽
Vol 338-342
◽
pp. 181-184