scholarly journals REMOTE PLASMA CHEMICAL VAPOUR DEPOSITION OF SILICON NITRIDE FILMS

1991 ◽  
Vol 02 (C2) ◽  
pp. C2-847-C2-847
Author(s):  
S. E. ALEXANDROV ◽  
A. Y. KOVALGIN
Keyword(s):  
Silicon Nitride ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Remote Plasma ◽  
Plasma Chemical ◽  
Silicon Nitride Films ◽  
Plasma Chemical Vapour Deposition

SiCN alloys obtained by remote plasma chemical vapour deposition from novel precursors

2003 ◽  
Vol 429 (1-2) ◽  
pp. 144-151 ◽  
Author(s):  
T.P. Smirnova ◽  
A.M. Badalian ◽  
L.V. Yakovkina ◽  
V.V. Kaichev ◽  
V.I. Bukhtiyarov ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Remote Plasma ◽  
Plasma Chemical ◽  
Plasma Chemical Vapour Deposition
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