Fabrication of size‐tunable hierarchical CrN nanohole arrays for two‐dimensional nanomould using modified nanosphere lithography

2014 ◽  
Vol 9 (8) ◽  
pp. 491-495 ◽  
Author(s):  
Hung‐Chun Wu ◽  
MingDong Bao ◽  
Kung‐Jeng Ma
Keyword(s):  
Nanosphere Lithography ◽  
Two Dimensional ◽  
Nanohole Arrays

FABRICATION OF TWO-DIMENSIONAL PHOTONIC CRYSTALS WITH GE2SB2TE5 NANOHOLE ARRAYS BY NANOSPHERE LITHOGRAPHY

2009 ◽  
Vol 23 (06n07) ◽  
pp. 1300-1305
Author(s):  
KI-HO SONG ◽  
HYUN-YONG LEE ◽  
HOE-YOUNG YANG ◽  
SUNG-WON KIM ◽  
JAE-HEE SEO ◽  
...  
Keyword(s):  
Photonic Crystals ◽  
Plasma Treatment ◽  
Treatment Time ◽  
Reduction Rate ◽  
Nanosphere Lithography ◽  
Two Dimensional ◽  
Photonic Bandgaps ◽  
Nanohole Arrays ◽  
Plasma Treatment Time ◽  
Lift Off

Two-dimensional photonic crystals (2D-PCs) with Ge 2 Sb 2 Te 5 ( GST ) nanohole arrays were prepared by the nanosphere lithography (NSL) process. A primary factor of PCs is that the refractive index (n) and the n-modulation can be realized by using the GST films, which exhibit a reversible phase transformation between amorphous and crystalline states by laser illumination. The polystyrene (PS) spheres with a diameter of 500 nm were spin-coated on Si substrate and subsequently reduced by O 2-plasma treatment. The reduced spheres were utilized as a lift-off mask of the NSL process and their size and separation could be precisely controlled. Amorphous GST films were thermally evaporated and then the reduced PS spheres were removed. The fabricated GST nanohole arrays were observed by SEM and AFM. The nanohole diameters are nearly linearly reduced with increasing plasma-treatment time (t). The reduction rate (δ) for the conditions of this work was evaluated to be ~ 0.92 nm/s. The period (Λ) and filling factor (η) of PCs are structure parameters that determine their photonic bandgaps (PBGs). η-modulation can be easily achieved via a control of t and the Λ can be also modulated by the use of PS spheres with specific diameter. In addition, the PBGs for the fabricated GST 2 D PC were calculated by considering the amorphous and crystalline states of GST .

Fabrication of size-tunable, periodic Si nanohole arrays by plasma modified nanosphere lithography and anisotropic wet etching

2012 ◽  
Vol 263 ◽  
pp. 430-435 ◽  
Author(s):  
S.L. Cheng ◽  
Y.H. Lin ◽  
S.W. Lee ◽  
T. Lee ◽  
H. Chen ◽  
...  
Keyword(s):  
Nanosphere Lithography ◽  
Wet Etching ◽  
Nanohole Arrays

scholarly journals Tailoring plasmonic properties of gold nanohole arrays for surface-enhanced Raman scattering

2015 ◽  
Vol 17 (33) ◽  
pp. 21211-21219 ◽  
Author(s):  
Peng Zheng ◽  
Scott K. Cushing ◽  
Savan Suri ◽  
Nianqiang Wu
Keyword(s):  
Raman Scattering ◽  
Tuning Range ◽  
Nanosphere Lithography ◽  
Surface Enhanced Raman Scattering ◽  
Nanohole Array ◽  
Surface Enhanced ◽  
Nanohole Arrays ◽  
Surface Enhanced Raman ◽  
Enhanced Raman Scattering ◽  
Plasmonic Tuning

The wide plasmonic tuning range of nanotriangle and nanohole array patterns fabricated by nanosphere lithography makes them promising in surface-enhanced Raman scattering (SERS) sensors.

Two-dimensional multispectral imager based on tiled arrangement of metallic nanohole arrays

2014 ◽  
Author(s):  
Mohamadreza Najiminaini ◽  
Bozena Kaminska ◽  
Jeffrey J. L. Carson
Keyword(s):  
Two Dimensional ◽  
Nanohole Arrays ◽  
Multispectral Imager

Integration of tunable two-dimensional nanostructures on a chip by an improved nanosphere lithography method

2016 ◽  
Vol 27 (22) ◽  
pp. 225301 ◽  
Author(s):  
Haibin Ni ◽  
Ming Wang ◽  
Hui Hao ◽  
Jing Zhou
Keyword(s):  
Nanosphere Lithography ◽  
Two Dimensional

Optical properties of thick metal nanohole arrays fabricated by electron-beam and nanosphere lithography

2009 ◽  
Vol 206 (5) ◽  
pp. 976-979 ◽  
Author(s):  
Ahmad Reza Hajiaboli ◽  
Bo Cui ◽  
M. Kahrizi ◽  
Vo-Van Truong
Keyword(s):  
Optical Properties ◽  
Electron Beam ◽  
Nanosphere Lithography ◽  
Nanohole Arrays
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