Size- and temperature-independent zero-offset current-voltage characteristics of GaInP/GaAs collector-up tunnelling-collector heterojunction bipolar transistors

2001 ◽  
Vol 37 (4) ◽  
pp. 252 ◽  
Author(s):  
K. Mochizuki ◽  
T. Oka ◽  
I. Ohbu
2009 ◽  
Vol 615-617 ◽  
pp. 979-982 ◽  
Author(s):  
Hiroki Miyake ◽  
Tsunenobu Kimoto ◽  
Jun Suda

GaN/SiC Heterojunction Bipolar Transistors (HBTs) with ultra-thin AlN insertion layers at the n-GaN/p-SiC emitter junction are proposed to improve carrier injection efficiency. The current-voltage characteristics of n-GaN/AlN/p-SiC heterojunctions have exhibited very small reverse leakage and good rectification. The capacitance-voltage measurement have revealed that the conduction band offset between n-GaN and p-SiC has been reduced from -0.74 eV to -0.54 eV by insertion of AlN, indicating that the GaN/AlN/SiC heterojunction may show better electron-injection efficiency. A significantly improved common-base current gain (α~0.2) is obtained for GaN/AlN/SiC HBTs with initial N* pre-irradiation, while it was very low (α~0.001) for GaN/SiC HBTs without AlN layers.


2001 ◽  
Vol 24 (4) ◽  
pp. 265-287
Author(s):  
K. F. Yarn ◽  
K. H. Ho

Heterojunction bipolar transistors (HBT) based on Npn AlGaAs/GaAs material system have attracted considerable attention for microwave power and digital applications due to their high speed and high current capabilities. In this paper, a numerical model based on the Npn AlGaAs/GaAs HBT structure for the carrier transport is presented. Three figures of merit on device operation, current gain, cut-off frequency and maximum oscillation frequency are calculated. Besides, thermal instability plays an important role on power HBT resulted from the low thermal conductivity in GaAs. The generated heat will increase the junction temperature and cause self-destruction. Therefore, the thermal runaway study of the junction temperature, current–voltage (IV) characteristics and frequency response using an analytical thermal model is described.


2014 ◽  
Vol 778-780 ◽  
pp. 1189-1192 ◽  
Author(s):  
Kazuhiro Mochizuki ◽  
Tomoyoshi Mishima ◽  
Yuya Ishida ◽  
Yoshitomo Hatakeyama ◽  
Kazuki Nomoto ◽  
...  

An effective acceptor level (EAeff) for representing the increased ionization ratio in extrinsically photon-recycled p-type GaN is proposed.EAeffat 300 K in the range of 0.1360.145 eV is found to reproduce current/voltage characteristics of transmission-line-model patterns formed with GaN p-n junction epitaxial layers and electrode spacing of 320 μm when the p-n diode current flowing through an 80×100-μm electrode is 90 mA. WhenEAeffis decreased from 0.160 eV to 0.145 eV, the on-resistance of 18×100-μm GaN bipolar transistors is predicted to be reduced by more than 50%.


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