High-responsivity porous-SiC thin-film pn junction photodetector

1998 ◽  
Vol 34 (23) ◽  
pp. 2243 ◽  
Author(s):  
K.H. Wu ◽  
Y.K. Fang ◽  
W.T. Hsieh ◽  
J.J. Ho ◽  
W.J. Lin ◽  
...  
2012 ◽  
Vol 33 (7) ◽  
pp. 1033-1035 ◽  
Author(s):  
Qinghong Zheng ◽  
Feng Huang ◽  
Jin Huang ◽  
Qichan Hu ◽  
Dagui Chen ◽  
...  

2020 ◽  
Vol 10 (1) ◽  
Author(s):  
Gilbert Kogo ◽  
Bo Xiao ◽  
Samuel Danquah ◽  
Harold Lee ◽  
Julien Niyogushima ◽  
...  

Proceedings ◽  
2018 ◽  
Vol 2 (13) ◽  
pp. 785
Author(s):  
Markus Leitgeb ◽  
Christopher Zellner ◽  
Manuel Dorfmeister ◽  
Michael Schneider ◽  
Ulrich Schmid

In preliminary studies it could be shown that single crystalline silicon carbide wafers can be porosified with metal assisted photochemical etching. Furthermore, the generation of porous areas which are locally defined is possible with this method. By adjusting the etching parameters, a highly porous layer (degree of porosity of 90%) can be formed which is under-etched by a line of breakage. By depositing a compressively stressed amorphous SiC:H thin film on top of a porous region, the a-SiC:H film can be locally separated from the substrate, resulting in a buckled membrane configuration. Such membranes might open up potential applications in MEMS design concepts.


2017 ◽  
Vol 9 (18) ◽  
pp. 15592-15598 ◽  
Author(s):  
Han Sol Lee ◽  
Kyunghee Choi ◽  
Jin Sung Kim ◽  
Sanghyuck Yu ◽  
Kyeong Rok Ko ◽  
...  

2015 ◽  
Vol 36 (1) ◽  
pp. 44-46 ◽  
Author(s):  
Zingway Pei ◽  
Hsin-Cheng Lai ◽  
Jian-Yu Wang ◽  
Wei-Hung Chiang ◽  
Chien-Hsun Chen

2013 ◽  
Vol 228 ◽  
pp. S77-S80 ◽  
Author(s):  
Huijun Zhang ◽  
Tingyu Han ◽  
Jingliang Cheng ◽  
Tooru Harigai ◽  
Akimitsu Hatta ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document