Observation of negative differential resistance in Al0.2Ga0.8As/Al0.4Ga0.6As/GaAs double barrier resonant tunnelling structure

1988 ◽  
Vol 24 (25) ◽  
pp. 1554
Author(s):  
C.H. Yang ◽  
H.D. Shih
1987 ◽  
Vol 23 (3) ◽  
pp. 116 ◽  
Author(s):  
M. Razeghi ◽  
A. Tardella ◽  
R.A. Davies ◽  
A.P. Long ◽  
M.J. Kelly ◽  
...  

2011 ◽  
Vol 99 (18) ◽  
pp. 182109 ◽  
Author(s):  
M. Boucherit ◽  
A. Soltani ◽  
E. Monroy ◽  
M. Rousseau ◽  
D. Deresmes ◽  
...  

2006 ◽  
Vol 928 ◽  
Author(s):  
Andreas Fissel ◽  
Dirk Kuehne ◽  
Eberhard Bugiel ◽  
H. Joerg Osten

ABSTRACTDouble-barrier insulator/Si/insulator nanostructures on Si(111) were prepared using molecular beam epitaxy. Ultrathin single-crystalline Si buried in a single-crystalline insulator matrix with sharp interfaces was obtained by a novel approach based on an epitaxial encapsulated solid-phase epitaxy. As an example, we demonstrate the growth of Si buried in Gd2O3 and the incorporation of epitaxial Si islands into single-crystalline Gd2O3. The I-V characteristic of the obtained nanostructures exhibited negative differential resistance at low temperatures, however, with a strong memory effect.


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